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Source author record

Li-Syuan Lu

Li-Syuan Lu appears in the imported research catalog. Authorship, coauthor and topic links are available while profile ownership is still unclaimed.

ResearcherUnclaimed source record
physics.app-phphysics.opticscond-mat.mtrl-scicond-mat.str-el

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Published work

3 published item(s)

preprint2022arXiv

Exciton-Driven Renormalization of Quasiparticle Band Structure in Monolayer MoS2

Optical excitation serves as a powerful approach to control the electronic structure of layered Van der Waals materials via many-body screening effects, induced by photoexcited free carriers, or via light-driven coherence, such as optical Stark and Bloch-Siegert effects. Although theoretical work has also pointed to an exotic mechanism of renormalizing band structure via excitonic correlations in bound electron-hole pairs (excitons), experimental observation of such exciton-driven band renormalization and the full extent of their implications is still lacking, largely due to the limitations of optical probes and the impact of screening effects. Here, by using extreme-ultraviolet time-resolved angle-resolved photoemission spectroscopy together with excitonic many-body theoretical calculations, we directly unmask the band renormalization effects driven by excitonic correlations in a monolayer semiconductor. We revealed a surprising bandgap opening, increased by 40 meV, and a simultaneous enhancement of band effective mass. Our findings unmask the novel exciton-driven mechanism towards the band engineering in photoexcited semiconducting materials, opening a new playground to manipulate the transient energy states in layered quantum materials via optical controls of excitonic many-body correlations.

0 citations0 reviewsNo code linkedOpen access
preprint2021arXiv

Ultrafast Laser Ablation, Intrinsic Threshold, and Nanopatterning of Monolayer Molybdenum Disulfide

Laser direct writing is an attractive method for patterning 2D materials without contamination. Literature shows that the femtosecond ablation threshold of graphene across substrates varies by an order of magnitude. Some attribute it to the thermal coupling to the substrates, but it remains by and large an open question. For the first time the effect of substrates on femtosecond ablation of 2D materials is studied using MoS$_{2}$ as an example. We show unambiguously that femtosecond ablation of MoS$_{2}$ is an adiabatic process with negligible heat transfer to the substrates. The observed threshold variation is due to the etalon effect which was not identified before for the laser ablation of 2D materials. Subsequently, an intrinsic ablation threshold is proposed as a true threshold parameter for 2D materials. Additionally, we demonstrate for the first time femtosecond laser patterning of monolayer MoS$_{2}$ with sub-micron resolution and mm/s speed. Moreover, engineered substrates are shown to enhance the ablation efficiency, enabling patterning with low-power femtosecond oscillators. Finally, a zero-thickness approximation is introduced to predict the field enhancement with simple analytical expressions. Our work clarifies the role of substrates on ablation and firmly establishes femtosecond laser ablation as a viable route to pattern 2D materials.

0 citations0 reviewsNo code linkedOpen access
preprint2021arXiv

Ultrafast Multi-Shot Ablation and Defect Generation in Monolayer Transition Metal Dichalcogenides

Transition metal dichalcogenides are known to possess large optical nonlinearities and driving these materials at high intensities is desirable for many applications. Understanding their optical responses under repetitive intense excitation is essential to improve the performance limit of these strong-field devices and to achieve efficient laser patterning. Here, we report the incubation study of monolayer MoS${}_{2}$ and WS${}_{2}$ induced by 160 fs, 800 nm pulses in air to examine how their ablation threshold scales with the number of admitted laser pulses. Both materials were shown to outperform graphene and most bulk materials; specifically, MoS${}_{2}$ is as resistant to radiation degradation as the best of the bulk thin films with a record fast saturation. Our modeling provides convincing evidence that the small reduction in threshold and fast saturation of MoS${}_{2}$ originates in its excellent bonding integrity against radiation-induced softening. Sub-ablation damages, in the forms of vacancies, lattice disorder, and nano-voids, were revealed by transmission electron microscopy, photoluminescence, Raman, and second harmonic generation studies, which were attributed to the observed incubation. For the first time, a sub-ablation damage threshold is identified for monolayer MoS${}_{2}$ to be 78% of single-shot ablation threshold, below which MoS${}_{2}$ remains intact for many laser pulses. Our results firmly establish MoS${}_{2}$ as a robust material for strong-field devices and for high-throughput laser patterning.

0 citations0 reviewsNo code linkedOpen access