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David Z. Pan

David Z. Pan appears in the imported research catalog. Authorship, coauthor and topic links are available while profile ownership is still unclaimed.

ResearcherUnclaimed source record
Hardware ArchitectureEmerging TechnologiesMachine Learningphysics.opticsOther Computer ScienceComputer Visioncond-mat.mes-hallCryptography and SecurityData Structures and Algorithmsphysics.app-ph

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Published work

23 published item(s)

preprint2023arXiv

Domain Wall-Magnetic Tunnel Junction Analog Content Addressable Memory Using Current and Projected Data

With the rise in in-memory computing architectures to reduce the compute-memory bottleneck, a new bottleneck is present between analog and digital conversion. Analog content-addressable memories (ACAM) are being recently studied for in-memory computing to efficiently convert between analog and digital signals. Magnetic memory elements such as magnetic tunnel junctions (MTJs) could be useful for ACAM due to their low read/write energy and high endurance, but MTJs are usually restricted to digital values. The spin orbit torque-driven domain wall-magnetic tunnel junction (DW-MTJ) has been recently shown to have multi-bit function. Here, an ACAM circuit is studied that uses two domain wall-magnetic tunnel junctions (DW-MTJs) as the analog storage elements. Prototype DW-MTJ data is input into the magnetic ACAM (MACAM) circuit simulation, showing ternary CAM function. Device-circuit co-design is carried out, showing that 8-10 weight bits are achievable, and that designing asymmetrical spacing of the available DW positions in the device leads to evenly spaced ACAM search bounds. Analyzing available spin orbit torque materials shows platinum provides the largest MACAM search bound while still allowing spin orbit torque domain wall motion, and that the circuit is optimized with minimized MTJ resistance, minimized spin orbit torque material resistance, and maximized tunnel magnetoresistance. These results show the feasibility of using DW-MTJs for MACAM and provide design parameters.

0 citations0 reviewsNo code linkedOpen access
preprint2023arXiv

Lightening-Transformer: A Dynamically-operated Optically-interconnected Photonic Transformer Accelerator

The wide adoption and significant computing resource of attention-based transformers, e.g., Vision Transformers and large language models (LLM), have driven the demand for efficient hardware accelerators. There is a growing interest in exploring photonics as an alternative technology to digital electronics due to its high energy efficiency and ultra-fast processing speed. Photonic accelerators have shown promising results for CNNs, which mainly rely on weight-static linear operations. However, they encounter issues when efficiently supporting Transformer architectures, questioning the applicability of photonics to advanced ML tasks. The primary hurdle lies in their inefficiency in handling unique workloads in Transformers, i.e., dynamic and full-range tensor multiplication. In this work, we propose Lightening-Transformer, the first light-empowered, high-performance, and energy-efficient photonic Transformer accelerator. To overcome prior designs' fundamental limitations, we introduce a novel dynamically-operated photonic tensor core, DPTC, a crossbar array of interference-based optical vector dot-product engines supporting highly parallel, dynamic, and full-range matrix multiplication. Furthermore, we design a dedicated accelerator that integrates our novel photonic computing cores with photonic interconnects for inter-core data broadcast, fully unleashing the power of optics. Comprehensive evaluations show that ours achieves >2.6x energy and >12x latency reductions compared to prior photonic accelerators and delivers the lowest energy cost and 2 to 3 orders of magnitude lower energy-delay product compared to electronic Transformer accelerators, all while maintaining digital-comparable accuracy. Our work highlights the immense potential of photonics for advanced ML workloads, such as Transformer-backboned LLM. Our work is available at https://github.com/zhuhanqing/Lightening-Transformer.

0 citations0 reviewsNo code linkedOpen access
preprint2023arXiv

M3ICRO: Machine Learning-Enabled Compact Photonic Tensor Core based on PRogrammable Multi-Operand Multimode Interference

Photonic computing shows promise for transformative advancements in machine learning (ML) acceleration, offering ultra-fast speed, massive parallelism, and high energy efficiency. However, current photonic tensor core (PTC) designs based on standard optical components hinder scalability and compute density due to their large spatial footprint. To address this, we propose an ultra-compact PTC using customized programmable multi-operand multimode interference (MOMMI) devices, named M3ICRO. The programmable MOMMI leverages the intrinsic light propagation principle, providing a single-device programmable matrix unit beyond the conventional computing paradigm of one multiply-accumulate (MAC) operation per device. To overcome the optimization difficulty of customized devices that often requires time-consuming simulation, we apply ML for optics to predict the device behavior and enable a differentiable optimization flow. We thoroughly investigate the reconfigurability and matrix expressivity of our customized PTC, and introduce a novel block unfolding method to fully exploit the computing capabilities of a complex-valued PTC for near-universal real-valued linear transformations. Extensive evaluations demonstrate that M3ICRO achieves a 3.4-9.6x smaller footprint, 1.6-4.4x higher speed, 10.6-42x higher compute density, 3.7-12x higher system throughput, and superior noise robustness compared to state-of-the-art coherent PTC designs, while maintaining close-to-digital task accuracy across various ML benchmarks. Our code is open-sourced at https://github.com/JeremieMelo/M3ICRO-MOMMI.

0 citations0 reviewsNo code linkedOpen access
preprint2022arXiv

A compact butterfly-style silicon photonic-electronic neural chip for hardware-efficient deep learning

The optical neural network (ONN) is a promising hardware platform for next-generation neurocomputing due to its high parallelism, low latency, and low energy consumption. Previous ONN architectures are mainly designed for general matrix multiplication (GEMM), leading to unnecessarily large area cost and high control complexity. Here, we move beyond classical GEMM-based ONNs and propose an optical subspace neural network (OSNN) architecture, which trades the universality of weight representation for lower optical component usage, area cost, and energy consumption. We devise a butterfly-style photonic-electronic neural chip to implement our OSNN with up to 7x fewer trainable optical components compared to GEMM-based ONNs. Additionally, a hardware-aware training framework is provided to minimize the required device programming precision, lessen the chip area, and boost the noise robustness. We experimentally demonstrate the utility of our neural chip in practical image recognition tasks, showing that a measured accuracy of 94.16% can be achieved in hand-written digit recognition tasks with 3-bit weight programming precision.

0 citations0 reviewsNo code linkedOpen access
preprint2022arXiv

ADEPT: Automatic Differentiable DEsign of Photonic Tensor Cores

Photonic tensor cores (PTCs) are essential building blocks for optical artificial intelligence (AI) accelerators based on programmable photonic integrated circuits. PTCs can achieve ultra-fast and efficient tensor operations for neural network (NN) acceleration. Current PTC designs are either manually constructed or based on matrix decomposition theory, which lacks the adaptability to meet various hardware constraints and device specifications. To our best knowledge, automatic PTC design methodology is still unexplored. It will be promising to move beyond the manual design paradigm and "nurture" photonic neurocomputing with AI and design automation. Therefore, in this work, for the first time, we propose a fully differentiable framework, dubbed ADEPT, that can efficiently search PTC designs adaptive to various circuit footprint constraints and foundry PDKs. Extensive experiments show superior flexibility and effectiveness of the proposed ADEPT framework to explore a large PTC design space. On various NN models and benchmarks, our searched PTC topology outperforms prior manually-designed structures with competitive matrix representability, 2-30x higher footprint compactness, and better noise robustness, demonstrating a new paradigm in photonic neural chip design. The code of ADEPT is available at https://github.com/JeremieMelo/ADEPT using the https://github.com/JeremieMelo/pytorch-onn (TorchONN) library.

0 citations0 reviewsNo code linkedOpen access
preprint2022arXiv

Delving into Effective Gradient Matching for Dataset Condensation

As deep learning models and datasets rapidly scale up, network training is extremely time-consuming and resource-costly. Instead of training on the entire dataset, learning with a small synthetic dataset becomes an efficient solution. Extensive research has been explored in the direction of dataset condensation, among which gradient matching achieves state-of-the-art performance. The gradient matching method directly targets the training dynamics by matching the gradient when training on the original and synthetic datasets. However, there are limited deep investigations into the principle and effectiveness of this method. In this work, we delve into the gradient matching method from a comprehensive perspective and answer the critical questions of what, how, and where to match. We propose to match the multi-level gradients to involve both intra-class and inter-class gradient information. We demonstrate that the distance function should focus on the angle, considering the magnitude simultaneously to delay the overfitting. An overfitting-aware adaptive learning step strategy is also proposed to trim unnecessary optimization steps for algorithmic efficiency improvement. Ablation and comparison experiments demonstrate that our proposed methodology shows superior accuracy, efficiency, and generalization compared to prior work.

0 citations0 reviewsNo code linkedOpen access
preprint2022arXiv

Fuse and Mix: MACAM-Enabled Analog Activation for Energy-Efficient Neural Acceleration

Analog computing has been recognized as a promising low-power alternative to digital counterparts for neural network acceleration. However, conventional analog computing is mainly in a mixed-signal manner. Tedious analog/digital (A/D) conversion cost significantly limits the overall system's energy efficiency. In this work, we devise an efficient analog activation unit with magnetic tunnel junction (MTJ)-based analog content-addressable memory (MACAM), simultaneously realizing nonlinear activation and A/D conversion in a fused fashion. To compensate for the nascent and therefore currently limited representation capability of MACAM, we propose to mix our analog activation unit with digital activation dataflow. A fully differential framework, SuperMixer, is developed to search for an optimized activation workload assignment, adaptive to various activation energy constraints. The effectiveness of our proposed methods is evaluated on a silicon photonic accelerator. Compared to standard activation implementation, our mixed activation system with the searched assignment can achieve competitive accuracy with $>$60% energy saving on A/D conversion and activation.

0 citations0 reviewsNo code linkedOpen access
preprint2022arXiv

TAG: Learning Circuit Spatial Embedding From Layouts

Analog and mixed-signal (AMS) circuit designs still rely on human design expertise. Machine learning has been assisting circuit design automation by replacing human experience with artificial intelligence. This paper presents TAG, a new paradigm of learning the circuit representation from layouts leveraging text, self-attention and graph. The embedding network model learns spatial information without manual labeling. We introduce text embedding and a self-attention mechanism to AMS circuit learning. Experimental results demonstrate the ability to predict layout distances between instances with industrial FinFET technology benchmarks. The effectiveness of the circuit representation is verified by showing the transferability to three other learning tasks with limited data in the case studies: layout matching prediction, wirelength estimation, and net parasitic capacitance prediction.

0 citations0 reviewsNo code linkedOpen access
preprint2020arXiv

TimingCamouflage+: Netlist Security Enhancement with Unconventional Timing (with Appendix)

With recent advances in reverse engineering, attackers can reconstruct a netlist to counterfeit chips by opening the die and scanning all layers of authentic chips. This relatively easy counterfeiting is made possible by the use of the standard simple clocking scheme, where all combinational blocks function within one clock period, so that a netlist of combinational logic gates and flip-flops is sufficient to duplicate a design. In this paper, we propose to invalidate the assumption that a netlist completely represents the function of a circuit with unconventional timing. With the introduced wave-pipelining paths, attackers have to capture gate and interconnect delays during reverse engineering, or to test a huge number of combinational paths to identify the wave-pipelining paths. To hinder the test-based attack, we construct false paths with wave-pipelining to increase the counterfeiting challenge. Experimental results confirm that wave-pipelining true paths and false paths can be constructed in benchmark circuits successfully with only a negligible cost, thus thwarting the potential attack techniques.

0 citations0 reviewsNo code linkedOpen access
preprint2015arXiv

E-BLOW: E-Beam Lithography Overlapping aware Stencil Planning for MCC System

Electron beam lithography (EBL) is a promising maskless solution for the technology beyond 14nm logic node. To overcome its throughput limitation, industry has proposed character projection (CP) technique, where some complex shapes (characters) can be printed in one shot. Recently the traditional EBL system is extended into multi-column cell (MCC) system to further improve the throughput. In MCC system, several independent CPs are used to further speed-up the writing process. Because of the area constraint of stencil, MCC system needs to be packed/planned carefully to take advantage of the characters. In this paper, we prove that the overlapping aware stencil planning (OSP) problem is NP-hard. To solve OSP problem in MCC system, we present a tool, E-BLOW, with several novel speedup techniques, such as successive relaxation, dynamic programming, and KD-Tree based clustering. Experimental results show that, compared with previous works, E-BLOW demonstrates better performance for both conventional EBL system and MCC system.

0 citations0 reviewsNo code linkedOpen access
preprint2014arXiv

A High-Performance Triple Patterning Layout Decomposer with Balanced Density

Triple patterning lithography (TPL) has received more and more attentions from industry as one of the leading candidate for 14nm/11nm nodes. In this paper, we propose a high performance layout decomposer for TPL. Density balancing is seamlessly integrated into all key steps in our TPL layout decomposition, including density-balanced semi-definite programming (SDP), density-based mapping, and density-balanced graph simplification. Our new TPL decomposer can obtain high performance even compared to previous state-of-the-art layout decomposers which are not balanced-density aware, e.g., by Yu et al. (ICCAD'11), Fang et al. (DAC'12), and Kuang et al. (DAC'13). Furthermore, the balanced-density version of our decomposer can provide more balanced density which leads to less edge placement error (EPE), while the conflict and stitch numbers are still very comparable to our non-balanced-density baseline.

0 citations0 reviewsNo code linkedOpen access
preprint2014arXiv

E-BLOW: E-Beam Lithography Overlapping aware Stencil Planning for MCC System

Electron beam lithography (EBL) is a promising maskless solution for the technology beyond 14nm logic node. To overcome its throughput limitation, recently the traditional EBL system is extended into MCC system. %to further improve the throughput. In this paper, we present E-BLOW, a tool to solve the overlapping aware stencil planning (OSP) problems in MCC system. E-BLOW is integrated with several novel speedup techniques, i.e., successive relaxation, dynamic programming and KD-Tree based clustering, to achieve a good performance in terms of runtime and solution quality. Experimental results show that, compared with previous works, E-BLOW demonstrates better performance for both conventional EBL system and MCC system.

0 citations0 reviewsNo code linkedOpen access
preprint2014arXiv

EPIC: Efficient prediction of IC manufacturing hotspots with a unified meta-classification formulation

In this paper we present EPIC, an efficient and effective predictor for IC manufacturing hotspots in deep sub-wavelength lithography. EPIC proposes a unified framework to combine different hotspot detection methods together, such as machine learning and pattern matching, using mathematical programming/optimization. EPIC algorithm has been tested on a number of industry benchmarks under advanced manufacturing conditions. It demonstrates so far the best capability in selectively combining the desirable features of various hotspot detection methods (3.5-8.2% accuracy improvement) as well as significant suppression of the detection noise (e.g., 80% false-alarm reduction). These characteristics make EPIC very suitable for conducting high performance physical verification and guiding efficient manufacturability friendly physical design.

0 citations0 reviewsNo code linkedOpen access
preprint2014arXiv

GLOW: A global router for low-power thermal-reliable interconnect synthesis using photonic wavelength multiplexing

In this paper, we examine the integration potential and explore the design space of low power thermal reliable on-chip interconnect synthesis featuring nanophotonics Wavelength Division Multiplexing (WDM). With the recent advancements, it is foreseen that nanophotonics holds the promise to be employed for future on-chip data signalling due to its unique power efficiency, signal delay and huge multiplexing potential. However, there are major challenges to address before feasible on-chip integration could be reached. In this paper, we present GLOW, a hybrid global router to provide low power opto-electronic interconnect synthesis under the considerations of thermal reliability and various physical design constraints such as optical power, delay and signal quality. GLOW is evaluated with testing cases derived from ISPD07-08 global routing benchmarks. Compared with a greedy approach, GLOW demonstrates around 23%-50% of total optical power reduction, revealing great potential of on-chip WDM interconnect synthesis.

0 citations0 reviewsNo code linkedOpen access
preprint2014arXiv

L-Shape based Layout Fracturing for E-Beam Lithography

Layout fracturing is a fundamental step in mask data preparation and e-beam lithography (EBL) writing. To increase EBL throughput, recently a new L-shape writing strategy is proposed, which calls for new L-shape fracturing, versus the conventional rectangular fracturing. Meanwhile, during layout fracturing, one must minimize very small/narrow features, also called slivers, due to manufacturability concern. This paper addresses this new research problem of how to perform L-shaped fracturing with sliver minimization. We propose two novel algorithms. The first one, rectangular merging (RM), starts from a set of rectangular fractures and merges them optimally to form L-shape fracturing. The second algorithm, direct L-shape fracturing (DLF), directly and effectively fractures the input layouts into L-shapes with sliver minimization. The experimental results show that our algorithms are very effective.

0 citations0 reviewsNo code linkedOpen access
preprint2014arXiv

Layout Decomposition for Quadruple Patterning Lithography and Beyond

For next-generation technology nodes, multiple patterning lithography (MPL) has emerged as a key solution, e.g., triple patterning lithography (TPL) for 14/11nm, and quadruple patterning lithography (QPL) for sub-10nm. In this paper, we propose a generic and robust layout decomposition framework for QPL, which can be further extended to handle any general K-patterning lithography (K$>$4). Our framework is based on the semidefinite programming (SDP) formulation with novel coloring encoding. Meanwhile, we propose fast yet effective coloring assignment and achieve significant speedup. To our best knowledge, this is the first work on the general multiple patterning lithography layout decomposition.

0 citations0 reviewsNo code linkedOpen access
preprint2014arXiv

Layout decomposition for triple patterning lithography

As minimum feature size and pitch spacing further decrease, triple patterning lithography (TPL) is a possible 193nm extension along the paradigm of double patterning lithography (DPL). However, there is very little study on TPL layout decomposition. In this paper, we show that TPL layout decomposition is a more difficult problem than that for DPL. We then propose a general integer linear programming formulation for TPL layout decomposition which can simultaneously minimize conflict and stitch numbers. Since ILP has very poor scalability, we propose three acceleration techniques without sacrificing solution quality: independent component computation, layout graph simplification, and bridge computation. For very dense layouts, even with these speedup techniques, ILP formulation may still be too slow. Therefore, we propose a novel vector programming formulation for TPL decomposition, and solve it through effective semidefinite programming (SDP) approximation. Experimental results show that the ILP with acceleration techniques can reduce 82% runtime compared to the baseline ILP. Using SDP based algorithm, the runtime can be further reduced by 42% with some tradeoff in the stitch number (reduced by 7%) and the conflict (9% more). However, for very dense layouts, SDP based algorithm can achieve 140x speed-up even compared with accelerated ILP.

0 citations0 reviewsNo code linkedOpen access
preprint2014arXiv

Lithography Hotspot Detection and Mitigation in Nanometer VLSI

With continued feature size scaling, even state of the art semiconductor manufacturing processes will often run into layouts with poor printability and yield. Identifying lithography hotspots is important at both physical verification and early physical design stages. While detailed lithography simulations can be very accurate, they may be too computationally expensive for full-chip scale and physical design inner loops. Meanwhile, pattern matching and machine learning based hotspot detection methods can provide acceptable quality and yet fast turn-around-time for full-chip scale physical verification and design. In this paper, we discuss some key issues and recent results on lithography hotspot detection and mitigation in nanometer VLSI.

0 citations0 reviewsNo code linkedOpen access
preprint2014arXiv

Methodology for standard cell compliance and detailed placement for triple patterning lithography

As the feature size of semiconductor process further scales to sub-16nm technology node, triple patterning lithography (TPL) has been regarded one of the most promising lithography candidates. M1 and contact layers, which are usually deployed within standard cells, are most critical and complex parts for modern digital designs. Traditional design flow that ignores TPL in early stages may limit the potential to resolve all the TPL conflicts. In this paper, we propose a coherent framework, including standard cell compliance and detailed placement to enable TPL friendly design. Considering TPL constraints during early design stages, such as standard cell compliance, improves the layout decomposability. With the pre-coloring solutions of standard cells, we present a TPL aware detailed placement, where the layout decomposition and placement can be resolved simultaneously. Our experimental results show that, with negligible impact on critical path delay, our framework can resolve the conflicts much more easily, compared with the traditional physical design flow and followed layout decomposition.

0 citations0 reviewsNo code linkedOpen access
preprint2014arXiv

Self-Aligned Double Patterning Friendly Configuration for Standard Cell Library Considering Placement

Self-aligned double patterning (SADP) has become a promising technique to push pattern resolution limit to sub-22nm technology node. Although SADP provides good overlay controllability, it encounters many challenges in physical design stages to obtain conflict-free layout decomposition. In this paper, we study the impact on placement by different standard cell layout decomposition strategies. We propose a SADP friendly standard cell configuration which provides pre-coloring results for standard cells. These configurations are brought into the placement stage to help ensure layout decomposability and save the extra effort for solving conflicts in later stages.

0 citations0 reviewsNo code linkedOpen access
preprint2014arXiv

TRIAD: a triple patterning lithography aware detailed router

TPL-friendly detailed routers require a systematic approach to detect TPL conflicts. However, the complexity of conflict graph (CG) impedes directly detecting TPL conflicts in CG. This work proposes a token graph-embedded conflict graph (TECG) to facilitate the TPL conflict detection while maintaining high coloring-flexibility. We then develop a TPL aware detailed router (TRIAD) by applying TECG to a gridless router with the TPL stitch generation. Compared to a greedy coloring approach, experimental results indicate that TRIAD generates no conflicts and few stitches with shorter wirelength at the cost of 2.41x of runtime.

0 citations0 reviewsNo code linkedOpen access
preprint2014arXiv

Triple Patterning Lithography (TPL) Layout Decomposition using End-Cutting

Triple patterning lithography (TPL) is one of the most promising techniques in the 14nm logic node and beyond. However, traditional LELELE type TPL technology suffers from native conflict and overlapping problems. Recently LELEEC process was proposed to overcome the limitations, where the third mask is used to generate the end-cuts. In this paper we propose the first study for LELEEC layout decomposition. Conflict graphs and end-cut graphs are constructed to extract all the geometrical relationships of input layout and end-cut candidates. Based on these graphs, integer linear programming (ILP) is formulated to minimize the conflict number and the stitch number.

0 citations0 reviewsNo code linkedOpen access
preprint2014arXiv

Triple Patterning Lithography (TPL) Layout Decomposition using End-Cutting (JM3 Special Session)

Triple patterning lithography (TPL) is one of the most promising techniques in the 14nm logic node and beyond. Conventional LELELE type TPL technology suffers from native conflict and overlapping problems. Recently, as an alternative process, triple patterning lithography with end cutting (LELE-EC) was proposed to overcome the limitations of LELELE manufacturing. In LELE-EC process the first two masks are LELE type double patterning, while the third mask is used to generate the end-cuts. Although the layout decomposition problem for LELELE has been well-studied in the literature, only few attempts have been made to address the LELE-EC layout decomposition problem. In this paper we propose the comprehensive study for LELE-EC layout decomposition. Conflict graph and end-cut graph are constructed to extract all the geometrical relationships of both input layout and end-cut candidates. Based on these graphs, integer linear programming (ILP) is formulated to minimize the conflict number and the stitch number. The experimental results demonstrate the effectiveness of the proposed algorithms.

0 citations0 reviewsNo code linkedOpen access