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David Johnson

David Johnson contributes to research discovery and scholarly infrastructure.

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Published work

3 published item(s)

preprint2022arXiv

An Experience Report of Executive-Level Artificial Intelligence Education in the United Arab Emirates

Teaching artificial intelligence (AI) is challenging. It is a fast moving field and therefore difficult to keep people updated with the state-of-the-art. Educational offerings for students are ever increasing, beyond university degree programs where AI education traditionally lay. In this paper, we present an experience report of teaching an AI course to business executives in the United Arab Emirates (UAE). Rather than focusing only on theoretical and technical aspects, we developed a course that teaches AI with a view to enabling students to understand how to incorporate it into existing business processes. We present an overview of our course, curriculum and teaching methods, and we discuss our reflections on teaching adult learners, and to students in the UAE.

preprint2022arXiv

Autocorrelation, Wigner and Ambiguity Transforms on Polygons for Coherent Radiation Rendering

Simulating the radar illumination of large scenes generally relies on a geometric model of light transport which largely ignores prominent wave effects. This can be remedied through coherence ray-tracing, but this requires the Wigner transform of the aperture. This diffraction function has been historically difficult to generate, and is relevant in the fields of optics, holography, synchrotron-radiation, quantum systems and radar. In this paper we provide the Wigner transform of arbitrary polygons through geometric transforms and the Stokes Fourier transform; and display its use in Monte-Carlo rendering.

preprint2020arXiv

Fast fourier transform and multi-Gaussian fitting of XRR data to determine the thickness of ALD grown thin films within the initial growth regime

While a linear growth behavior is one of the fingerprints of textbook atomic layer deposition processes, the growth often deviates from that behavior in the initial regime, i.e. the first few cycles of a process. To properly understand the growth behavior in the initial regime is particularly important for applications that rely on the exact thickness of very thin films. The determination of the thicknesses of the initial regime, however, often requires special equipment and techniques that are not always available. We propose a thickness determination method that is based on X-ray reflectivity (XRR) measurements on double layer structures, i.e. substrate/base layer/top layer. XRR is a standard thin film characterization method. Utilizing the inherent properties of fast Fourier transformation in combination with a multi-Gaussian fitting routine permits the determination of thicknesses down to $t \approx 2$ nm. We evaluate the boundaries of our model, which are given by the separation and full width at half maximum of the individual Gaussians. Finally, we compare our results from two layer stacks with data from X-ray fluorescence spectroscopy, which is a standard method for measuring ultra thin films.