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Zhi-Qing Li

Zhi-Qing Li appears in the imported research catalog. Authorship, coauthor and topic links are available while profile ownership is still unclaimed.

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cond-mat.mes-hallcond-mat.dis-nncond-mat.mtrl-scicond-mat.supr-con

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Published work

17 published item(s)

preprint2022arXiv

Charge carriers trapping by the full-configuration defects in metal halide perovskites quantum dots

Metal halide perovskites quantum dots (MHPQDs) have aroused enormous interesting in the photovoltaic and photoelectric because of their marvelous properties and size characteristics. However, one of key problems that how to systematically analyze charge carriers trapping by different defects is still a challenge task. Here, we study nonradiation multiphonon processes of the charge carrier trapping by various defects in MHPQDs based on the well-known Huang-Rhys model, in which a method of fullconfiguration defect, including different defect species with variable depth and lattice relaxation strength, is developed by introducing a localization parameter in the quantum defect model. With the help of this method, these fastest trapping channels for charge carriers transferring from the quantum dot ground state to different defects are found. Furthermore, the dependences of the trapping time on the radius of quantum dot, the defect depth and temperature are given. These results not only enrich the knowledge of charge carrier trapping processes by defects, but enlighten the designs of MHPQDs-based photovoltaic and photoelectric devices.

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preprint2022arXiv

Electrical transport properties of thick and thin Ta-doped SnO$_2$ films

Ta-doped SnO$_2$ films with high conductivity and high optical transparency have been successfully fabricated using rf-sputtering method and their electrical transport properties have been investigated. All films reveal degenerate semiconductor (metal) characteristics in electrical transport properties. For the thick films ($t\sim 1\,μ\rm{m}$ with $t$ being the thickness) deposited in pure argon, the electron-phonon scattering alone cannot explain the temperature dependent behaviors of resistivity, the interference effect between electron-phonon and electron-impurity scattering should be considered. For the $t\lesssim 36$ nm films, both conductivity and the Hall coefficient show linear relation with the logarithm of temperature ($\ln T$) from $\sim$100 K down to liquid helium temperature. The $\ln T$ behaviors of conductivity and Hall coefficient cannot be explained by the Altshuler-Aronov type electron-electron interaction effect, but can be quantitatively interpreted by the electron-electron interaction effects in the presence of granularity. Our results not only provide strong supports for the theoretical results on the electron-phonon-impurity interference effect, but also confirm the validity of the theoretical predictions of charge transport in granular metals in strong coupling regime.

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preprint2022arXiv

High-mobility two-dimensional electron gas in $γ$-Al$_2$O$_3$/SrTiO$_3$ heterostructures

The origin of the two-dimensional electron gas (2DEG) in the interface between $γ$-Al$_2$O$_3$ (GAO) and SrTiO$_3$ (STO) (GAO/STO) as well as the reason for the high mobility of the 2DEG is still in debate. In this paper, the electronic structures of [001]-oriented GAO/STO heterostructures with and without oxygen vacancies are investigated by first-principle calculations based on the density functional theory. The calculation results show that the necessary condition for the formation of 2DEG is that the GAO/STO heterostructure has the interface composed of Al and TiO$_2$ layers. For the heterostructure without oxygen vacancy on the GAO side, the 2DEG originates from the polar discontinuity near the interface, and there is a critical thickness for the GAO film, below which the 2DEG would not present and the heterostructure exhibits insulator characteristics. For the case that only the GAO film contains oxygen vacancies, the polar discontinuity near the interface disappears, but the 2DEG still exists. In this situation, the critical thickness of the GAO film for 2DEG formation does not exist either. When the GAO film and STO substrate both contain oxygen vacancies, it is found that the 2DEG retains as long as the oxygen vacancies on the STO side are not very close to the interface. The low-temperature mobilities of the 2DEGs in these GAO/STO heterostructures are considered to be governed by the ionized impurity scattering, and $\sim$3 to $\sim$11 times as large as that in LaAlO$_3$/SrTiO$_3$ heterojunction. The high mobility of the 2DEG is mainly due to the small electron effective mass in GAO/STO heterostructure.

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preprint2022arXiv

Infrared optical absorption of Frohlich polaron in metal halide perovskites

The formation of Frohlich polaron in metal halide perovskites, arising from the charge carrierlongitudinal optical (LO) phonon coupling, has been proposed to explain their exceptional properties, but the effective identification of polaron in these materials is still a challenge task. Herein, we theoretically present the infrared optical absorption of Frohlich polaron based on Huang-Rhys model. We find that multiphonon overtones are appeared as the energy of incident photon matches the multiple LO phonons, wherein the average phonon numbers of a polaron can be directly evaluated by the order of the strongest overtone. These multiphonon structures sensitively depend on the scale of electronic distribution in the ground state and the dimensionality of the perovskite materials, which gives the enlightenment for the effective modulation of competing processes between the polaron formation and carrier cooling. Moreover, the order of the strongest overtone shifts to the higher ones with temperature, providing a potential proof of the carriers mobility affected by LO phonons scattering. The present model not only suggests a direct way to verify Frohlich polaron, but also enriches the understanding of the polaron properties in metal halide perovskites.

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preprint2020arXiv

Disorder and magnetic field induced Bose-metal state in two-dimensional Ta$_x$(SiO$_2$)$_{1-x}$ granular films

The origin of the intermediate anomalous metallic state in two-dimensional superconductor materials remains enigmatic. In the present paper, we observe such a state in a series of $\sim$9.0 nm thick Ta$_x$(SiO$_2$)$_{1-x}$ ($x$ being the volume fraction of Ta) nanogranular films. At zero field, the $x$ $\gtrsim$ 0.75 films undergo a Berezinskii-Kosterlitz-Thouless transition as transform from normal to superconducing states upon cooling. For the $x$ $\lesssim$ 0.71 films, the resistance increases with decreasing temperature from 2 K down to 40 mK. A normal state to anomalous metallic state transition is observed in the $x$ $\simeq$ 0.73 film, i.e., near the transition temperature, the resistance of the film decreases sharply upon cooling as if the system would cross over to superconducting state, but then saturates to a value far less than that in normal state. When a small magnetic field perpendicular to the film plane is applied, the anomalous metallic state occurs in the $x$ $\gtrsim$ 0.75 films. It is found that both disorder and magnetic field can induce the transition from superconductor to anomalous metal and their influences on the transition are similar. For the the magnetic field induced case, we find the sheet resistance $R_{\square}(T,H)$ ($T$ and $H$ being the temperature and the magnitude of magnetic field) data near the crossover from the anomalous metal to superconductor and in the vicinity of the anomalous metal to insulator transition, respectively, obey unique scaling laws deduced from the Bose-metal model. Our results strongly suggest that the anomalous metallic state in the Ta$_x$(SiO$_2$)$_{1-x}$ granular films is bosonic and dynamical gauge field fluctuation resulting from superconducting quantum fluctuations plays a key role in its formation.

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preprint2019arXiv

Universal Hall coefficient correction in strongly coupled Cr-SiO$_2$ nanogranular metals

The microstructure and electrical transport of Cr$_x$(SiO$_2$)$_{1-x}$ nanogranular films with Cr volume faction $x$$\simeq$0.67 and 0.72 are systematically investigated. The transmission electron microscopy images and elemental mappings indicate that the films are quite inhomogeneous: some Cr granules directly connect to others while some Cr granules with size $\sim$1 to $\sim$3\,nm disperse in the SiO$_2$ dielectric matrix. For each film, the Hall coefficient $R_H$ varies linearly with the natural logarithm of temperature, i.e., $ΔR_H$$\propto$$\ln T$, above $\sim$60\,K, saturates at $\sim$60\,K, and retains the saturating value below $\sim$60\,K. The temperature dependence of Hall coefficient can be explained by the recent theory in granular metals and originates from \emph{virtual diffusion} of electrons through the metallic granules. For the conductivity $σ$, a robust $Δσ$$\propto$$\sqrt{T}$ law is observed from $\sim$50 down to 2\,K. The behavior of the conductivity stems from the ``Altshuler-Aronov" correction, whose influence on the Hall coefficient is not present in the films.

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preprint2018arXiv

Electron effective mass and electronic structure in nonstoichiometric a-IGZO films

The transport properties and optical transmittance and absorption spectra for the nostoichiometric amorphous Indium Gallium Zinc Oxide (a-IGZO) films with Gallium and Zinc deficiencies are investigated. The resistivity and carrier concentration variation with temperature both reveal that the films possess degenerate semiconductor (or metal) characteristics. The thermopower is negative and decreases linearly with decreasing temperature, indicating the electron diffusion thermopower governs the thermal transport process in each film. Using free-electron-like model, we extracted the electron effective mass, which is about three times as large as that of the stoichiometric one and increases with increasing carrier (electron) concentration. Neglecting the variation in the energy with the wavevector near the valence band maximum and using the free-electron-like model, we also obtained the electron effective mass via the optical absorption spectra measurement. The magnitude of the effective mass obtained via optical spectra measurement is comparable to that obtained via thermopower measurement for each film. Our results strongly suggest that the nostoichiometric a-IGZO films possess free-electron-like pseudo-energy-bandstructure.

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preprint2017arXiv

Correction of exciton binding energy in monolayer transition metal dichalcogenides

We theoretically investigate the corrections of exciton binding energy in monolayer transition metal dichalcogenides (TMDs) due to the exciton-optical phonon coupling in the Fr$\ddot{o}$hlich interaction model by using the linear operator combined Lee-Low-Pines variational method. We not only consider the excitons couple with the intrinsic longitudinal optical (LO) phonon modes, but also the surface optical phonon modes that induced by the polar substrates underneath the TMDs. We find that exciton binding energies are corrected in a large scale due to these exciton-optical phonon couplings. We discuss the dependences of exciton binding energy on the cut-off wave vector of optical phonon modes, the polarization parameters of materials and the interlayer distance between the polar substrates and TMDs. These results provide potential explanations for the divergence of the exciton binding energy between experiment and theory in TMDs.

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preprint2015arXiv

Crossover of electron-electron interaction effect in Sn-doped indium oxide films

We systematically study the structures and electrical transport properties of a series of Sn-doped indium oxide (ITO) films with thickness $t$ ranging from $\sim$5 to $\sim$53\,nm. Scanning electron microscopy and x-ray diffraction results indicate that the $t\lesssim 16.8$\,nm films are polycrystalline, while those $t\gtrsim 26.7$\,nm films are epitaxially grown along [100] direction. For the epitaxial films, the Altshuler and Aronov electron-electron interaction (EEI) effect governs the temperature behaviors of the sheet conductance $σ_\square$ at low temperatures, and the ratios of relative change of Hall coefficient $ΔR_H/R_H$ to relative change of sheet resistance $ΔR_\square/R_\square$ are $\approx$2, which is quantitatively consistent with Altshuler and Aronov EEI theory and seldom observed in other systems. For those polycrystalline films, both the sheet conductance and Hall coefficient vary linearly with logarithm of temperature below several tens Kelvin, which can be well described by the current EEI theories in granular metals. We extract the intergranular tunneling conductance of each film by comparing the $σ_\square(T)$ data with the predication of EEI theories in granular metals. It is found that when the tunneling conductance is less than the conductance of a single indium tin oxide (ITO) grain, the ITO film reveals granular metal characteristics in transport properties, conversely, the film shows transport properties of homogeneous disordered conductors. Our results indicate that electrical transport measurement can not only reveal the underlying charge transport properties of the film but also be a powerful tool to detect the subtle homogeneity of the film.

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preprint2015arXiv

Simultaneous observation of small- and large-energy-transfer electron-electron scattering in three dimensional indium oxide thick films

In three dimensional (3D) disordered metals, the electron-phonon (\emph{e}-ph) scattering is the sole significant inelastic process. Thus the theoretical predication concerning the electron-electron (\emph{e}-\emph{e}) scattering rate $1/τ_φ$ as a function of temperature $T$ in 3D disordered metal has not been fully tested thus far, though it was proposed 40 years ago [A. Schmid, Z. Phys. \textbf{271}, 251 (1974)]. We report here the simultaneous observation of small- and large-energy-transfer \emph{e}-\emph{e} scattering in 3D indium oxide thick films. In temperature region of $T\gtrsim100$\,K, the temperature dependence of resistivities curves of the films obey Bloch-Grüneisen law, indicating the films possess degenerate semiconductor characteristics in electrical transport property. In the low temperature regime, $1/τ_φ$ as a function of $T$ for each film can not be ascribed to \emph{e}-ph scattering. To quantitatively describe the temperature behavior of $1/τ_φ$, both the 3D small- and large-energy-transfer \emph{e}-\emph{e} scattering processes should be considered (The small- and large-energy-transfer \emph{e}-\emph{e} scattering rates are proportional to $T^{3/2}$ and $T^2$, respectively). In addition, the experimental prefactors of $T^{3/2}$ and $T^{2}$ are proportional to $k_F^{-5/2}\ell^{-3/2}$ and $E_F^{-1}$ ($k_F$ is the Fermi wave number, $\ell$ is the electron elastic mean free path, and $E_F$ is the Fermi energy), respectively, which are completely consistent with the theoretical predications. Our experimental results fully demonstrate the validity of theoretical predications concerning both small- and large-energy-transfer \emph{e}-\emph{e} scattering rates.

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preprint2014arXiv

Linear temperature behavior of thermopower and strong electron-electron scattering in thick F-doped SnO$_{2}$ films

Both the semi-classical and quantum transport properties of F-doped SnO$_2$ thick films ($\sim$1\,$μ$m) were investigated experimentally. It is found that the resistivity caused by the thermal phonons obeys Bloch-Grüneisen law from $\sim$90 to 300\,K, while only the diffusive thermopower, which varies linearly with temperature from 300 down to 10\,K, can be observed.The phonon-drag thermopower is completely suppressed due to the long electron-phonon relaxation time in the compound. These observations, together with the temperature independent characteristic of carrier concentration, indicate that the conduction electron in F-doped SnO$_2$ films behaves essentially like a free electron. At low temperatures, the electron-electron scattering dominates over the electron-phonon scattering and governs the inelastic scattering process. The theoretical predicated scattering rates for both large- and small-energy-transfer electron-electron scattering processes, which are negligibly weak in three-dimensional disordered conventional conductors, are quantitatively tested in this lower carrier concentration and free-electron-like highly degenerate semiconductor.

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preprint2013arXiv

Electron-electron scatttering in Sn-doped indium oxide thick films

We have measured the low-field magnetoresistances (MRs) of a series of Sn-doped indium oxide thick films in the temperature $T$ range 4--35 K. The electron dephasing rate $1/τ_φ$ as a function of $T$ for each film was extracted by comparing the MR data with the three-dimensional (3D) weak-localization theoretical predictions. We found that the extracted $1/τ_φ$ varies linearly with $T^{3/2}$. Furthermore, at a given $T$, $1/τ_φ$ varies linearly with $k_F^{-5/2}l^{-3/2}$, where $k_{F}$ is the Fermi wavenumber, and $l$ is the electron elastic mean free path. These features are well explained in terms of the small-energy-transfer electron-electron scattering time in 3D disordered conductors. This electron dephasing mechanism dominates over the electron-phonon ($e$-ph) scattering process because the carrier concentrations in our films are $\sim$ 3 orders of magnitude lower than those in typical metals, which resulted in a greatly suppressed $e$-ph relaxation rate.

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preprint2013arXiv

Observation of double percolation transitions in Ag-SnO$_2$ nanogranular films

Two percolation transitions are observed in Ag$_x$(SnO$_2)_{1-x}$ nanogranular films with Ag volume fraction $x$ ranging from $\sim$0.2 to $\sim$0.9. In the vicinity of each percolation threshold $x_{ci}$ ($i$$=$1, 2), the variation in $σ$ with $x$ obeys a power law for $x$$>$$x_{ci}$. The origin of the first percolation transition at $x_{c1}$ ($x_{c1}$$>$$x_{c2}$) is similar to that of the classical one, while the second transition is explained as originating from the tunneling to the second-nearest neighboring Ag particles. These observations provide strong experimental support for the validity of current theories concerning tunneling effect in conductor-insulator nanogranular composites.

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preprint2013arXiv

Structures, optical properties, and electrical transport processes of SnO$_2$ films with oxygen deficiencies

The structures, optical and electrical transport properties of SnO$_2$ films, fabricated by rf sputtering method at different oxygen partial pressures, were systematically investigated. It has been found that preferred growth orientation of SnO$_2$ film is strongly related to the oxygen partial pressure during deposition, which provides an effective way to tune the surface texture of SnO$_2$ film. All films reveal relatively high transparency in the visible range, and both the transmittance and optical band gap increase with increasing oxygen partial pressure. The temperature dependence of resisitivities was measured from 380 K down to liquid helium temperatures. At temperature above $\sim 80$ K, besides the nearest-neighbor-hopping process, thermal activation processes related to two donor levels ($\sim 30$ and $\sim 100$ meV below the conduction band minimum) of oxygen vacancies are responsible for the charge transport properties. Below $\sim 80$ K, Mott variable-range-hopping conduction process governs the charge transport properties at higher temperatures, while Efros-Shklovskii variable-range-hopping conduction process dominates the transport properties at lower temperatures. Distinct crossover from Mott type to Efros-Shklovskii type variable-range-hopping conduction process at several to a few tens kelvin are observed for all SnO$_2$ films.

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preprint2012arXiv

Electron dephasing in homogeneous and inhomogeneous indium tin oxide thin films

The electron dephasing processes in two-dimensional homogeneous and inhomogeneous indium tin oxide thin films have been investigated in a wide temperature range 0.3--90 K. We found that the small-energy-transfer electron-electron ($e$-$e$) scattering process dominated the dephasing from a few K to several tens K. At higher temperatures, a crossover to the large-energy-transfer $e$-$e$ scattering process was observed. Below about 1--2 K, the dephasing time $τ_φ$ revealed a very weak temperature dependence, which intriguingly scaled approximately with the inverse of the electron diffusion constant $D$, i.e., $τ_φ(T \approx 0.3 \, {\rm K}) \propto 1/D$. Theoretical implications of our results are discussed. The reason why the electron-phonon relaxation rate is negligibly weak in this low-carrier-concentration material is presented.

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preprint2011arXiv

Electrical conduction processes in ZnO in a wide temperature range 20--500 K

We have investigated the electrical conduction processes in as-grown and thermally cycled ZnO single crystal as well as as-grown ZnO polycrystalline films over the wide temperature range 20--500 K. In the case of ZnO single crystal between 110 and 500 K, two types of thermal activation conduction processes are observed. This is explained in terms of the existence of both shallow donors and intermediately deep donors which are consecutively excited to the conduction band as the temperature increases. By measuring the resistivity $ρ(T)$ of a given single crystal after repeated thermal cycling in vacuum, we demonstrate that oxygen vacancies play an important role in governing the shallow donor concentrations but leave the activation energy ($\simeq27\pm$2 meV) largely intact. In the case of polycrystalline films, two types of thermal activation conduction processes are also observed between $\sim$150 and 500 K. Below $\sim$150 K, we found an additional conduction process due to the nearest-neighbor-hopping conduction mechanism which takes place in the shallow impurity band. As the temperatures further decreases below $\sim$80 K, a crossover to the Mott variable-range-hopping conduction process is observed. Taken together with our previous measurements on $ρ(T)$ of ZnO polycrystalline films in the temperature range 2--100 K [Y. L. Huang {\it et al.}, J. Appl. Phys. \textbf{107}, 063715 (2010)], this work establishes a quite complete picture of the overall electrical conduction mechanisms in the ZnO material from liquid-helium temperatures up to 500 K.

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preprint2011arXiv

Logarithmic temperature dependence of Hall transport in granular metals

We have measured the Hall coefficient $R_H$ and the electrical conductivity $σ$ of a series of ultrathin indium tin oxide films between 2 and 300 K. A robust $R_H$\,$\propto$\,ln$T$ law is observed in a considerably wide temperature range of 2 and $\sim$120 K. This ln$T$ dependence is explained as originated from the electron-electron interaction effect in the presence of granularity, as newly theoretically predicted. Furthermore, we observed a $σ$\,$\propto$\,ln$T$ law from 3 K up to several tens K, which also arose from the Coulomb interaction effect in inhomogeneous systems. These results provide strong experimental supports for the current theoretical concepts for charge transport in granular metals with intergrain tunneling conductivity $g_T$$\gg$1.

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