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Researcher profile

Won Jong Yoo

Won Jong Yoo contributes to research discovery and scholarly infrastructure.

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cond-mat.mes-hallcond-mat.mtrl-scicond-mat.str-el

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Published work

5 published item(s)

preprint2022arXiv

Observation of strange metal in hole-doped valley-spin insulator

Temperature-linear resistance at low temperatures in strange metals is an exotic characteristic of strong correlation systems, as observed in high-TC superconducting cuprates, heavy fermions, Fe-based superconductors, ruthenates, and twisted bilayer graphene. Here, we introduce a hole-doped valley-spin insulator, V-doped WSe2, with hole pockets in the valence band. The strange metal characteristic was observed in VxW1-xSe2 at a critical carrier concentration of 9.5 x 10^20 cm-3 from 150 K to 1.8 K. The unsaturated magnetoresistance is almost linearly proportional to the magnetic field. Using the ansatz R(H,T) - R(0,0) ~ [(alpha.k.T)^2+(gamma.mu.B)^2]^1/2, the gamma/alpha ratio is estimated approximately to 4, distinct from that for the quasiparticles of LSCO, BaFe2(As1-xPx)2 (gamma/alpha=1) and bosons of YBCO (gamma/alpha=2). Our observation opens up the possible routes that induce strong correlation and superconductivity in two-dimensional materials with strong spin-orbit coupling.

0 citations0 reviewsNo code linkedOpen access
preprint2016arXiv

High Electric Field Carrier Transport and Power Dissipation in Multilayer Black Phosphorus Field Effect Transistor with Dielectric Engineering

This study addresses high electric field transport in multilayer black phosphorus (BP) field effect transistors (FETs) with self-heating and thermal spreading by dielectric engineering. Interestingly, we found that multilayer BP device on a SiO2 substrate exhibited a maximum current density of 3.3 x 10E10 A/m2 at an electric field of 5.58 MV/m, several times higher than multilayer MoS2. Our breakdown thermometry analysis revealed that self-heating was impeded along BP-dielectric interface, resulting in a thermal plateau inside the channel and eventual Joule breakdown. Using a size-dependent electro-thermal transport model, we extracted an interfacial thermal conductance of 1-10 MW/m2 K for the BP-dielectric interfaces. By using hBN as a dielectric material for BP instead of thermally resistive SiO2 (about 1.4 W/m K), we observed a 3 fold increase in breakdown power density and a relatively higher electric field endurance together with efficient and homogenous thermal spreading because hBN had superior structural and thermal compatibility with BP. We further confirmed our results based on micro-Raman spectroscopy and atomic force microscopy, and observed that BP devices on hBN exhibited centrally localized hotspots with a breakdown temperature of 600K, while the BP device on SiO2 exhibited a hotspot in the vicinity of the electrode at 520K.

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preprint2015arXiv

Carrier Transport at the Metal-MoS2 Interface

This study illustrates the nature of electronic transport and its transition from one mechanism to another between a metal electrode and MoS2 channel interface in a field effect transistor (FET) device. Interestingly, measurements of the contact resistance (Rc) as a function of temperature indicate a transition in the carrier transport across the energy barrier from a thermionic emission at a high temperature to tunneling at a low temperature. Furthermore, at a low temperature, the nature of the tunneling behavior is ascertained by the current-voltage dependency that helps us feature direct tunneling at a low bias and Fowler-Nordheim tunneling at a high bias for a Pd-MoS2 contact due to the effective barrier shape modulation by biasing. In contrast, only direct tunneling is observed for a Cr-MoS2 contact over the entire applied bias range. In addition, simple analytical calculations were carried out to extract Rc at the gating range, and the results are consistent with the experimental data. Our results describe the transition in carrier transport mechanisms across a metal-MoS2 interface, and this information provides guidance for the design of future flexible, transparent electronic devices based on 2-dimensional materials.

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preprint2015arXiv

P-type polar transition of chemically doped multilayer MoS2 transistor

The accessibility of both n-type and p-type MoS2 FET is necessary for complementary device applications involving MoS2. However, MoS2 PFET is rarely achieved due to pinning effect resulting high Rc at metal-MoS2 interface and the inherently strong n-type property of the MoS2 material. In this study, we realized a high-performance multi-layer MoS2 PFET via controllable chemical doping, which has an excellent on/off ratio of 107 and a maximum hole mobility of 72 cm2/Vs at room temperature, and these values are further exceeding to 109 and 132 cm2/Vs at 133K. In addition, we revealed that large Rc hindered the polar transition of MoS2 FET from n-type to p-type, meanwhile channel Rs limited Ion of PFET. Therefore it is suggested that reducing Rc at high work function metal-MoS2 interface and p-type doping of channel were necessary for achieving high performance MoS2 PFET. Based on the high performance PFET, we successfully demonstrated a MoS2 CMOS inverter by integrating NFET and PFET.

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preprint2015arXiv

Ultimate Thin Vertical p-n Junction Composed of 2D Layered Molybdenum Disulfide

Semiconducting 2D crystals are currently receiving significant attention due to their great potential to be an ultra-thin body for efficient electrostatic modulation which enables to overcome the limitations of silicon technology. Here we report that, as a key building block for 2D semiconductor devices, vertical p-n junctions are fabricated in ultrathin MoS2 by introducing AuCl3 and benzyl viologen dopants. Unlike usual unipolar MoS2, the MoS2 p-n junctions show (i) ambipolar carrier transport, (ii) current rectification via modulation of potential barrier in films thicker than 8 nm, and (iii) reversed current rectification via tunneling in films thinner than 8 nm. The ultimate thinness of the vertical p-n homogeneous junctions in MoS2 is experimentally found to be 3 nm, and the chemical doping depth is found to be 1.5 nm. The ultrathin MoS2 p-n junctions present a significant potential of the 2D crystals for flexible, transparent, high-efficiency electronic and optoelectronic applications.

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