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Smruti Rekha Mahapatra

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2 publications

preprint2023arXiv

Modulation-Doping a Correlated Electron Insulator

Correlated electron materials (CEMs) host a rich variety of condensed matter phases. Vanadium dioxide (VO2) is a prototypical CEM with a temperature-dependent metal-to-insulator (MIT) transition with a concomitant crystal symmetry change. External control of MIT in VO2 - especially without inducing structural changes - has been a long-standing challenge. In this work, we design and synthesize modulation-doped VO2-based thin film heterostructures that closely emulate a textbook example of filling control in a correlated electron insulator. Using a combination of charge transport, hard x-ray photoelectron spectroscopy, and structural characterization, we show that the insulating state can be doped to achieve carrier densities greater than 5x10^21 cm^(-3) without inducing any measurable structural changes. We find that the MIT temperature (T_MIT) continuously decreases with increasing carrier concentration. Remarkably, the insulating state is robust even at doping concentrations as high as ~0.2 e-/vanadium. Finally, our work reveals modulation-doping as a viable method for electronic control of phase transitions in correlated electron oxides with the potential for use in future devices based on electric-field controlled phase transitions.

preprint2019arXiv

Atomically-Smooth Single-Crystalline VO2_2 thin films with Bulk-like Metal-Insulator Transitions

Atomically-abrupt interfaces in transition metal oxide (TMO) heterostructures could host a variety of exotic condensed matter phases that may not be found in the bulk materials at equilibrium. A critical step in the development of such atomically-sharp interfaces is the deposition of atomically-smooth TMO thin films. Optimized deposition conditions exist for the growth of perovskite oxides. However, the deposition of rutile oxides, such as VO2_2, with atomic-layer precision has been challenging. In this work, we used pulsed laser deposition (PLD) to grow atomically-smooth VO2_2 thin films on rutile TiO2_2 (101) substrates. We show that optimal substrate preparation procedure followed by the deposition of VO2_2 films at a temperature conducive for step-flow growth mode is essential for achieving atomically-smooth VO2_2 films. The films deposited at optimal substrate temperatures show a step and terrace structure of the underlying TiO2_2 substrate. At lower deposition temperatures, there is a transition to a mixed growth mode comprising of island growth and layer-by-layer growth modes. VO2_2 films deposited at optimal substrate temperatures undergo a metal to insulator transition at a transition temperature of ∼\sim325 K with ∼\sim103^3 times increase in resistance, akin to MIT in bulk VO2_2.

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