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Rongbo Wu

Rongbo Wu appears in the imported research catalog. Authorship, coauthor and topic links are available while profile ownership is still unclaimed.

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physics.app-phphysics.optics

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Published work

6 published item(s)

preprint2022arXiv

High-production-rate fabrication of low-loss lithium niobate electro-optic modulators using photolithography assisted chemo-mechanical etching (PLACE)

Integrated thin-film lithium niobate (LN) electro-optic (EO) modulators of broad bandwidth, low insertion loss, low cost and high production rate are essential elements in contemporary inter-connection industries and disruptive applications. Here, we demonstrated the design and fabri-cation of a high performance thin-film LN EO modulator using photolithography assisted chemo-mechanical etching (PLACE) technology. Our device shows a 3-dB bandwidth over 50 GHz, along with a comparable low half wave voltage-length product of 2.16 Vcm. We obtain a fiber-to-fiber insertion loss of 2.6 dB.

0 citations0 reviewsNo code linkedOpen access
preprint2022arXiv

Monolithically integrated active passive waveguide array fabricated on thin film lithium niobate using a single continuous photolithography process

We demonstrate a robust low-loss optical interface by tiling passive (i.e., without doping of active ions) thin film lithium niobate (TFLN) and active (i.e., doped with rare earth ions) TFLN substrates for monolithic integration of passive/active lithium niobate photonics. The tiled substrates composed of both active and passive areas allow to pattern the mask of the integrated active passive photonic device at once using a single continuous photolithography process. The interface loss of tiled substrate is measured as low as 0.26 dB. Thanks to the stability provided by this approach, a four-channel waveguide amplifier is realized in a straightforward manner, which shows a net gain of ~5 dB at 1550-nm wavelength and that of ~8 dB at 1530-nm wavelength for each channel. The robust low-loss optical interface for passive/active photonic integration will facilitate large-scale high performance photonic devices which require on-chip light sources and amplifiers.

0 citations0 reviewsNo code linkedOpen access
preprint2022arXiv

Monolithically integrated waveguide-coupled single-frequency microlaser on erbium-doped thin film lithium niobate

We overcome the difficulty in realizing a monolithic waveguide-coupled microring laser integrated on erbium-doped thin film lithium niobate (Er: TFLN) using photolithography assisted chemo-mechanical etching (PLACE) technique. We demonstrate an integrated single-frequency microring laser operating around 1531 nm wavelength. The PLACE technique, enabling integrated Er: TFLN photonics with low propagation loss, can thus be used to realize low cost mass production of monolithic on-chip microlasers with applications ranging from optical communication and photonic integrated circuit (PIC) to precision metrology and large-scale sensing.

0 citations0 reviewsNo code linkedOpen access
preprint2021arXiv

On-chip integrated waveguide amplifiers on Erbium-doped thin film lithium niobate on insulator

We demonstrate on-chip light amplification with integrated optical waveguide fabricated on erbium-doped thin film lithium niobate on insulator (TFLNOI) using the photolithography assisted chemo-mechanical etching (PLACE) technique. A maximum internal net gain of 18 dB in the small-signal-gain regime is measured at the peak emission wavelength of 1530 nm for a waveguide length of 3.6 cm, indicating a differential gain per unit length of 5 dB/cm. This work paves the way to the monolithic integration of diverse active and passive photonic components on the TFLNOI platform.

0 citations0 reviewsNo code linkedOpen access
preprint2020arXiv

High-index-contrast single-mode optical waveguides fabricated on lithium niobate by photolithography assisted chemo-mechanical etching (PLACE)

We report fabrication of low loss single mode waveguides on lithium niobate on insulator (LNOI) cladded by a layer of SiO2. Our technique, termed photolithography assisted chemo-mechanical etching (PLACE), relies on patterning of a chromium film into the mask shape by femtosecond laser micromachining and subsequent chemo-mechanical etching of the lithium niobate thin film. The high-index-contrast single mode waveguide is measured to have a propagation loss of 0.13 dB/cm. Furthermore, waveguide tapers are fabricated for boosting the coupling efficiency.

0 citations0 reviewsNo code linkedOpen access
preprint2019arXiv

Efficient Electro-optical Tuning of Optical Frequency Microcomb on a Monolithically Integrated High-Q Lithium Niobate Microdisk

We demonstrate efficient tuning of a monolithically integrated lithium niobate microdisk (LN) optical frequency microcomb. Utilizing the high optical quality (Q) factor (i.e., Q~7.1*10^6) of the microdisk, the microcomb spans over a spectral bandwidth of ~200 nm at a pump power as low as 20.4 mW. Combining the large eletro-optic coefficient of LN and optimum design of the geometry of microelectrodes, we demonstrate electro-optical tuning of the comb with a spectral range of 400 pm and a tuning efficiency of ~38 pm/100V.

0 citations0 reviewsNo code linkedOpen access