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Namrata Bansal

Namrata Bansal contributes to research discovery and scholarly infrastructure.

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Published work

15 published item(s)

preprint2022arXiv

Magnetic domain walls of the van der Waals material Fe$_3$GeTe$_2$

Among two-dimensional materials, Fe$_3$GeTe$_2$ has come to occupy a very important place owing to its ferromagnetic nature with one of the highest Curie temperatures among known van der Waals materials and the potential for hosting skyrmions. In this combined experimental and theoretical work, we investigate the magnetic bubble domains as well as the microscopic domain wall profile using spin-polarized scanning tunneling microscopy in combination with atomistic spin-dynamics simulations performed with parameters from density functional theory calculations. We find a weak magneto-electric effect influencing the domain wall width by the electric field in the tunneling junction and determine the critical magnetic field for the collapse of the bubble domains. Our findings shed light on the origins of complex magnetism that Fe$_3$GeTe$_2$ exhibits.

preprint2014arXiv

Emergence of decoupled surface transport channels in bulk insulating Bi2Se3 thin films

In ideal topological insulator (TI) films the bulk state, which is supposed to be insulating, should not provide any electric coupling between the two metallic surfaces. However, transport studies on existing TI films show that the topological states on opposite surfaces are electrically tied to each other at thicknesses far greater than the direct coupling limit where the surface wavefunctions overlap. Here, we show that as the conducting bulk channels are suppressed, the parasitic coupling effect diminishes and the decoupled surface channels emerge as expected for ideal TIs. In Bi2Se3 thin films with fully suppressed bulk states, the two surfaces, which are directly coupled below ~10 QL, become gradually isolated with increasing thickness and are completely decoupled beyond ~20 QL. On such a platform, it is now feasible to implement transport devices whose functionality relies on accessing the individual surface layers without any deleterious coupling effects.

preprint2014arXiv

Robust topological surface states of Bi2Se3 thin films on amorphous SiO2/Si substrate and a large ambipolar gating effect

The recent emergence of topological insulators (TI) has spurred intensive efforts to grow TI thin films on various substrates. However, little is known about how robust the topological surface states (TSS) are against disorders and other detrimental effects originating from the substrates. Here, we report observation of a well-defined TSS on Bi2Se3 films grown on amorphous SiO2 (a-SiO2) substrates and a large gating effect on these films using the underneath doped-Si substrate as the back gate. The films on a-SiO2 were composed of c-axis ordered but random in-plane domains. However, despite the in-plane randomness induced by the amorphous substrate, the transport properties of these films were superior to those of similar films grown on single-crystalline Si(111) substrates, which are structurally better matched but chemically reactive with the films. This work sheds light on the importance of chemical compatibility, compared to lattice matching, for the growth of TI thin films, and also demonstrates that the technologically-important and gatable a-SiO2/Si substrate is a promising platform for TI films.

preprint2014arXiv

Transferring MBE-grown topological insulator films to arbitrary substrates and Metal-insulator transition via Dirac gap

Mechanical exfoliation of bulk crystals has been widely used to obtain thin topological insulator (TI) flakes for device fabrication. However, such a process produces only micro-sized flakes that are highly irregular in shape and thickness. In this work, we developed a process to transfer the entire area of TI Bi2Se3 thin films grown epitaxially on Al2O3 and SiO2 to arbitrary substrates, maintaining their pristine morphology and crystallinity. Transport measurements show that these transferred films have lower carrier concentrations and comparable or higher mobilities than before the transfer. Furthermore, using this process we demonstrated a clear metal-insulator transition in an ultrathin Bi2Se3 film by gate-tuning its Fermi level into the hybridization gap formed at the Dirac point. The ability to transfer large area TI films to any substrate will facilitate fabrication of TI heterostructure devices, which will help explore exotic phenomena such as Majorana fermions and topological magnetoelectricity.

preprint2012arXiv

Dirac cone shift of a passivated topological Bi2Se3 interface state

Gated terahertz cyclotron resonance measurements on epitaxial Bi2Se3 thin films capped with In2Se3 enable the first spectroscopic characterization of a single topological interface state from the vicinity of the Dirac point to above the conduction band edge. A precipitous drop in the scattering rate with Fermi energy is observed that is interpreted as the surface state decoupling from bulk states and evidence of a shift of the Dirac point towards mid-gap. Near the Dirac point, potential fluctuations of 50 meV are deduced from an observed loss of differential optical spectral weight near the Dirac point. Potential fluctuations are reduced by a factor of two at higher surface Fermi levels in the vicinity of the conduction band edge inferred from the width of the scattering rate step. The passivated topological interface state attains a high mobility of 3500 cm2/Vsec near the Dirac point.

preprint2012arXiv

Giant plateau in the THz Faraday angle in gated Bi2Se3

We report gated terahertz Faraday angle measurements on epitaxial Bi2Se3 thin films capped with In2Se3. A plateau is observed in the real part of the Faraday angle at an onset gate voltage corresponding to no band bending at the surface which persists into accumulation. The plateau is two orders of magnitude flatter than the step size expected from a single Landau Level in the low frequency limit, quantized in units of the fine structure constant. At 8 T, the plateau extends over a range of gate voltage that spans an electron density greater than 14 times the quantum flux density. Both the imaginary part of the Faraday angle and transmission measurements indicate dissipative off-axis and longitudinal conductivity channels associated with the plateau.

preprint2012arXiv

Thickness-independent transport channels in topological insulator Bi2Se3 thin films

With high quality topological insulator (TI) Bi2Se3 thin films, we report thickness-independent transport properties over wide thickness ranges. Conductance remained nominally constant as the sample thickness changed from 256 to ~8 QL (QL: quintuple layer, 1 QL = ~1 nm). Two surface channels of very different behaviors were identified. The sheet carrier density of one channel remained constant at ~3.0 x 10^13 cm^-2 down to 2 QL, while the other, which exhibited quantum oscillations, remained constant at ~8 x 10^12 cm^-2 only down to ~8 QL. The weak antilocalization parameters also exhibited similar thickness-independence. These two channels are most consistent with the topological surface states and the surface accumulation layers, respectively.

preprint2012arXiv

Topological-Metal to Band-Insulator Transition in (Bi1-xInx)2Se3 Thin Films

By combining transport and photo emission measurements on (Bi1-xInx)2Se3 thin films, we report that this system transforms from a topologically non-trivial metal into a topologically trivial band insulator through three quantum phase transitions. At x = 3-7%, there is a transition from a topologically non-trivial metal to a trivial metal. At x = 15%, the metal becomes a variable-range-hopping insulator. Finally, above x = 25%, the system becomes a true band insulator with its resistance immeasurably large even at room temperature. This material provides a new venue to investigate topologically tunable physics and devices with seamless gating/tunneling insulators.

preprint2011arXiv

Crucible aperture: an effective way to reduce source oxidation in oxide molecular beam epitaxy process

Growing multi-elemental complex-oxide structures using an MBE (Molecular Beam Epitaxy) technique requires precise control of each source flux. However, when the component elements have significantly different oxygen affinities, maintaining stable fluxes for easily oxidizing elements is challenging because of a source oxidation problem. Here, using Sr as a test source, we show that a crucible aperture insert scheme significantly reduces the source oxidation in an oxide-MBE environment. The crucible aperture insert was shaped like a disk with a hole at the center and was mounted inside the crucible; it blocks most of the oxygen species coming to the source, thus reducing the source oxidation. However, the depth of the aperture disk was critical for its performance; an ill-positioned aperture could make the flux stability even worse. With an optimally positioned aperture insert, the crucible exhibited more than four times improvement in Sr flux stability, compared to a conventional, non-apertured crucible.

preprint2011arXiv

Epitaxial growth of topological insulator Bi2Se3 film on Si(111) with atomically sharp interface

Atomically sharp epitaxial growth of Bi2Se3 films is achieved on Si (111) substrate with MBE (Molecular Beam Epitaxy). Two-step growth process is found to be a key to achieve interfacial-layer-free epitaxial Bi2Se3 films on Si substrates. With a single-step high temperature growth, second phase clusters are formed at an early stage. On the other hand, with low temperature growth, the film tends to be disordered even in the absence of a second phase. With a low temperature initial growth followed by a high temperature growth, second-phase-free atomically sharp interface is obtained between Bi2Se3 and Si substrate, as verified by RHEED (Reflection High Energy Electron Diffraction), TEM (Transmission Electron Microscopy) and XRD (X-Ray Diffraction). The lattice constant of Bi2Se3 is observed to relax to its bulk value during the first quintuple layer according to RHEED analysis, implying the absence of strain from the substrate. TEM shows a fully epitaxial structure of Bi2Se3 film down to the first quintuple layer without any second phase or an amorphous layer.

preprint2011arXiv

Metal-insulator transition on SrTiO$_{3}$ surface induced by ionic-bombardment

SrTiO$_{3}$ is one of the most popular insulating single-crystal substrates for various complex-oxide thin film growths, because of its good lattice match with many complex oxide films. Here, we show that a common thin film processing technique, argon ion-milling, creates highly conducting layer on the surface of STO, not only at room temperatures but also at cryogenic temperatures at which thermal diffusion is completely suppressed. Systematic \emph{in situ} four-point conductance measurements were taken on single-crystal STO substrates inside vacuum environment. The evolution of metallicity out of insulating STO follows simple models based on oxygen vacancy doping effect. At cryogenic temperatures, ion milling created a thin - but much thicker than the argon-penetration depth - steady-state oxygen-vacant layer, leading to a highly-concentric metallic state. Near room temperatures, however, significant thermal diffusion occurred and the metallic state continuously diffused into the bulk, leaving only low concentraion of electron carriers on the surface. Analysis of the discrepancy between the experiments and the models also provided evidence for vacany clustering, which seems to occur during any vacancy formation process and affects the observed conductance. These observations suggest that the transport properties of films processed on STO substrates using energetic methods such as ion milling need to be taken with caution. On the other hand, if properly controlled, ionic bombardment could be used as a way to create selective conducting layers on the surface of STO for device applications.

preprint2011arXiv

Simple self-gettering differential-pump for minimizing source oxidation in oxide-MBE environment

Source oxidation of easily oxidizing elements such as Ca, Sr, Ba, and Ti in an oxidizing ambient leads to their flux instability and is one of the biggest problems in the multi-elemental oxide Molecular Beam Epitaxy technique. Here we report a new scheme that can completely eliminate the source oxidation problem: a self-gettering differential pump using the source itself as the pumping medium. The pump simply comprises a long collimator mounted in front of the source in extended port geometry. With this arrangement, the oxygen partial pressure near the source was easily maintained well below the source oxidation regime, resulting in a stabilized flux, comparable to that of an ultra-high-vacuum environment. Moreover, this pump has a self-feedback mechanism that allows a stronger pumping effectiveness for more easily oxidizing elements, which is a desired property for eliminating the source oxidation problem.

preprint2011arXiv

Sr flux stability against oxidation in oxide-MBE environment: flux, geometry, and pressure dependence

Maintaining stable fluxes for multiple source elements is a challenging task when the source materials have significantly different oxygen affinities in a complex-oxide molecular-beam-epitaxy (MBE) environment. Considering that Sr is one of the most easily oxidized and widely used element in various complex oxides, we took Sr as a probe to investigate the flux stability problem in a number of different conditions. Source oxidation was less for higher flux, extended port geometry, and un-melted source shape. The extended port geometry also eliminated the flux transient after opening a source shutter as observed in the standard port. We also found that the source oxidation occurred more easily on the crucible wall than on the surface of the source material. Atomic oxygen, in spite of its stronger oxidation effectiveness, did not make any difference in source oxidation as compared to molecular oxygen in this geometry. Our results may provide a guide for solutions to the source oxidation problem in oxide-MBE system.

preprint2011arXiv

Surface versus bulk state in topological insulator Bi2Se3 under environmental disorder

Topological insulators (TIs) are predicted to be composed of an insulating bulk state along with conducting channels on the boundary of the material. In Bi2Se3, however, the Fermi level naturally resides in the conduction band due to intrinsic doping by selenium vacancies, leading to metallic bulk states. In such non-ideal TIs it is not well understood how the surface and bulk states behave under environmental disorder. In this letter, based on transport measurements of Bi2Se3 thin films, we show that the bulk states are sensitive to environmental disorder but the surface states remain robust.

preprint2011arXiv

Thickness-dependent bulk properties and weak anti-localization effect in topological insulator Bi2Se3

We show that a number of transport properties in topological insulator (TI) Bi2Se3 exhibit striking thickness-dependences over a range of up to five orders of thickness (3 nm - 170 μm). Volume carrier density decreased with thickness, presumably due to diffusion-limited formation of selenium vacancies. Mobility increased linearly with thickness in the thin film regime and saturated in the thick limit. The weak anti-localization effect was dominated by a single two-dimensional channel over two decades of thickness. The sublinear thickness-dependence of the phase coherence length suggests the presence of strong coupling between the surface and bulk states.