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Le Thuy Thanh Giang

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cond-mat.mtrl-sci cond-mat.mes-hall physics.optics

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preprint2015arXiv

Determination of the optimal shell thickness for self-catalysed GaAs/AlGaAs core-shell nanowires

We present a set of experimental results identifying various effects that govern the carrier dynamics of self-catalyzed GaAs/AlGaAs core-shell nanowires (NWs) grown by molecular beam epitaxy i.e. surface recombination velocity, surface charge traps, and structural defects. Time-resolved photoluminescence of NW ensemble and spatially-resolved cathodoluminescence of single NWs reveal that emission intensity, decay time and carrier diffusion length of the GaAs NW cores strongly depend on AlGaAs shell thickness but in a non-monotonic fashion. Although 7 nm-AlGaAs shell can efficiently suppress the surface recombination velocity of the GaAs NW cores, the effect of the band bending caused by the surface charges remains dominant if the shell thickness is less than 50 nm; that is, the carrier diffusion length is smaller in the NWs with a thinner shell caused by a stronger carrier scattering at the core/shell interface. If the AlGaAs shell thickness is larger than 50 nm, the luminescence efficiency of the GaAs NW cores starts to be deteriorated, ascribed to the defect formation inside the AlGaAs shell evidenced by transmission electron microscopy.

preprint2013arXiv

Residual strain and piezoelectric effects in passivated GaAs/AlGaAs core-shell nanowires

We observe a systematic red shift of the band-edge of passivated GaAs/Al0.35Ga0.65As core-shell nanowires with increasing shell thickness up to 100 nm. The shift is detected both in emission and absorption experiments, reaching values up to 14 meV for the thickest shell nanowires. Part of this red shift is accounted for by the small tensile strain imposed to the GaAs core by the AlGaAs shell, in line with theoretical calculations. An additional contribution to this red shift arises from axial piezoelectric fields which develop inside the nanowire core due to Al fluctuations in the shell.

preprint2012arXiv

Intrinsic limits governing MBE growth of Ga-assisted GaAs nanowires on Si(111)

Diffusion-enhanced and desorption-limited growth regimes of Ga-assisted GaAs nanowires were identified. In the latter regime, the number of vertical NWs with a narrow length distribution was increased by raising the growth temperature. The maximum axial growth rate; which can be quantified by the supplied rate of As atoms, is achieved when a dynamical equilibrium state is maintained in Ga droplets i.e. the number of impinging As atoms on the droplet surface is equivalent to that of direct deposited Ga atoms combining with the diffusing ones. The contribution of Ga diffusion to the wire growth was evidenced by the diameter-dependent NW axial growth rate.