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Changhyun Ko

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cond-mat.mes-hall cond-mat.mtrl-sci cond-mat.str-el physics.optics

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preprint2022arXiv

Nanoscale Thermal Imaging of VO$_2$ via Poole-Frenkel Conduction

We present a method for nanoscale thermal imaging of insulating thin films using atomic force microscopy (AFM), and we demonstrate its utility on VO$_2$. We sweep the applied voltage $V$ to a conducting AFM tip in contact mode and measure the local current $I$ through the film. By fitting the $IV$ curves to a Poole-Frenkel conduction model at low $V$, we calculate the local temperature with spatial resolution better than 50 nm using only fundamental constants and known film properties. Our thermometry technique enables local temperature measurement of \textit{any} insulating film dominated by the Poole-Frenkel conduction mechanism, and can be extended to insulators that display other conduction mechanisms.

preprint2013arXiv

Vanadium dioxide as a natural disordered metamaterial: perfect thermal emission and large broadband negative differential thermal emittance

We experimentally demonstrate that a thin (~150 nm) film of vanadium dioxide (VO2) deposited on sapphire has an anomalous thermal emittance profile when heated, which arises due to the optical interaction between the film and the substrate when the VO2 is at an intermediate state of its insulator-metal transition (IMT). Within the IMT region, the VO2 film comprises nanoscale islands of metal- and dielectric-phase, and can thus be viewed as a natural, disordered metamaterial. This structure displays "perfect" blackbody-like thermal emissivity over a narrow wavelength range (~40 cm-1), surpassing the emissivity of our black soot reference. We observed large broadband negative differential thermal emittance over a >10 °C range: upon heating, the VO2/sapphire structure emitted less thermal radiation and appeared colder on an infrared camera. We anticipate that emissivity engineering with thin film geometries comprising VO2 will find applications in infrared camouflage, thermal regulation, infrared tagging and labeling.

preprint2013arXiv

Voltage-triggered Ultra-fast Metal-insulator Transition in Vanadium Dioxide Switches

Electrically driven metal-insulator transition in vanadium dioxide (VO2) is of interest in emerging memory devices, neural computation, and high speed electronics. We report on the fabrication of out-of-plane VO2 metal-insulator-metal (MIM) structures and reproducible high-speed switching measurements in these two-terminal devices. We have observed a clear correlation between electrically-driven ON/OFF current ratio and thermally-induced resistance change during metal-insulator transition. It is also found that sharp metal-insulator transition could be triggered by external voltage pulses within 2 ns at room temperature and the achieved ON/OFF ratio is greater than two orders of magnitude with good endurance.

preprint2010arXiv

Three-terminal field effect devices utilizing thin film vanadium oxide as the channel layer

Electrostatic control of the metal-insulator transition (MIT) in an oxide semiconductor could potentially impact the emerging field of oxide electronics. Vanadium dioxide is of particular interest due to the fact that the MIT happens in the vicinity of room temperature and it is considered to exhibit the Mott transition. We present a detailed account of our experimental investigation into three-terminal field effect transistor-like devices using thin film VO2 as the channel layer. The gate is separated from the channel through an insulating gate oxide layer, enabling true probing of the field effect with minimal or no interference from large leakage currents flowing directly from the electrode. The influence of the fabrication of multiple components of the device, including the gate oxide deposition, on the VO2 film characteristics is discussed. Further, we discuss the effect of the gate voltage on the device response, point out some of the unusual characteristics including temporal dependence. A reversible unipolar modulation of the channel resistance upon the gate voltage is demonstrated for the first time in optimally engineered devices. The results presented in this work are of relevance towards interpreting gate voltage response in such oxides as well as addressing challenges in advancing gate stack processing for oxide semiconductors.