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Birger Brietzke

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3 publications

preprint2022arXiv

Onset of pattern formation in thin ferromagnetic films with perpendicular anisotropy

We consider the onset of pattern formation in an ultrathin ferromagnetic film of the form Ω~t:=Ω~×[0,t]\tildeΩ_t := \tildeΩ \times [0,t] for Ω~⋐R2\tilde{ Ω} \Subset \mathbb{R}^2 with preferred perpendicular magnetization direction. The relative micromagnetic energy is given by \begin{align} \mathcal{E}[M] &= \int_{\tildeΩ_t} d^2 |\nabla M|^2+ Q \int_{\tildeΩ_t} (M_1^2+M_2^2) + \int_{\mathbb{R}^3} |\mathcal{H}(M)|^2 - \int_{\mathbb{R}^3} |\mathcal{H}(e_3 χ_{\tilde{ Ω}})|^2, \end{align} describing the energy difference for a given magnetization M:R3→R3M : \mathbb{R}^3 \to \mathbb{R}^3 with ∣M∣=χΩ~t|M| = χ_{\tilde{ Ω}_t} and the uniform magnetization e3χΩ~te_3 χ_{\tilde{ Ω}_t}. For t≪dt \ll d, we establish the scaling of the energy and a BV-bound in the critical regime here the base area of the film is of order ∣Ω~∣∼(Q−1)1/2de2πdtQ−1|\tilde{ Ω}| \sim (Q-1)^{1/2} d e^{\frac{2πd}t \sqrt{Q-1}}. We furthermore investigate the onset of non-trivial pattern formation in the critical regime depending on the size of the rescaled film.

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