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Structured Back Gates for High-Mobility Two-Dimensional Electron Systems Using Oxygen Ion Implantation

We present a new approach of back gate patterning that is compatible with the requirements of highest mobility molecular beam epitaxy. Contrary to common back gating techniques, our method is simple, reliable and can be scaled up for entire wafers. The back gate structures are defined by local oxygen implantation into a silicon doped GaAs epilayer, which suppresses the conductance without affecting the surface quality.

preprint2016arXivOpen access
Matthias BerlLars TiemannWerner DietscheHelmut KarlWerner Wegscheider
cond-mat.mes-hall
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Open access5 authors1 topic
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Matthias BerlLars TiemannWerner DietscheHelmut KarlWerner Wegscheider

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