Abstract
We have reported the dependence of projectile mass along with the chemical reactivity and nonlinear effects on ion beam induced nano structure formation when 8 keV He1+, N1+, O1+, Ar1+ atomic ions and 16 keV N21+ and O21+ molecular ions are bombarded on the Si (100) surface at an incidence angle of 600. Ex situ atomic force microcopy (AFM) measurements reveals the ripple structure development of various forms and dimensions depending on the projectiles mass, chemical reactivity and molecular state. This experimental study explores the necessary requirements for ion induced nanopatterning and their control.
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