Precision beam telescope based on SOI pixel sensor technology for electrons in the energy range of sub-GeV to GeV

preprint2022arXivOpen access

Abstract

We developed a beam telescope system comprising five layers of 300-μμm-thick INTPIX4NA monolithic pixel sensors with each pixel size of 17 μμm square. The sensors were fabricated using silicon-on-insulator (SOI) technology. The signal-to-noise ratio of 140--230 is realized at a bias voltage of 20~V. The tracker system was tested using a positron beam of 200--822 MeV/c, and various tracking methods are examined to optimize spatial precision achievable at these energies. The best tracking precision including the precision of the sensor under test itself is 11.04 ±\pm 0.10 μμm for 822-MeV/c positrons for an equidistant sensor spacing of 32 mm. The achieved precision results combined with the intrinsic spatial resolution value obtained for a similar system using 120 GeV protons are used to estimate the tracking performance of electrons in the GeV energy range; a tracking precision of 2.22 μμm is evaluated for 5-GeV electrons. The method to estimate the tracking performance is verified using a Geant4-based simulation. The developed high precision tracker system enables to map the detailed performance of the sensors with pixel sizes of O\mathcal{O}(10 μμm), therefore will be a powerful system for development of devices targeting precision position resolutions.

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