Abstract

The transfer of graphene grown by chemical vapor deposition (CVD) using amorphous polymers represents a widely implemented method for graphene-based electronic device fabrication. However, the most commonly used polymer, poly(methyl methacrylate) (PMMA), leaves a residue on the graphene that limits the mobility. Here we report a method for graphene transfer and patterning that employs a perfluoropolymer---Hyflon---as a transfer handle and to protect graphene against contamination from photoresists or other polymers. CVD-grown graphene transferred this way onto LaAlO3_3/SrTiO3_3 heterostructures is atomically clean, with high mobility (~30,000 cm2^2V−1^{-1}s−1^{-1}) near the Dirac point at 2 K and clear, quantized Hall and magneto-resistance. Local control of the LaAlO3_3/SrTiO3_3 interfacial metal-insulator transition---through the graphene---is preserved with this transfer method. The use of perfluoropolymers such as Hyflon with CVD-grown graphene and other 2D materials can readily be implemented with other polymers or photoresists.

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