Abstract
Surface passivation with acidic (NH4)2S solution is shown to be effective in improving the interfacial and electrical properties of HfO2/GaSb metal oxide semiconductor devices. Compared with control samples, those treated with acidic (NH4)2S solution showed great improvements in frequency dispersion, gate leakage current and interface trap density. These improvements were attributed to the acidic (NH4)2S solution enhancing passivation of the substrates, which was analyzed from the perspective of chemical mechanism and confirmed by X-ray photoelectron spectroscopy and high-resolution cross-sectional transmission electron microscopy.
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