Abstract

The main promise of tunnel FETs (TFETs) is to enable supply voltage (VDDV_{DD}) scaling in conjunction with dimension scaling of transistors to reduce power consumption. However, reducing VDDV_{DD} and channel length (LchL_{ch}) typically deteriorates the ON- and OFF-state performance of TFETs, respectively. Accordingly, there is not yet any report of a high perfor]mance TFET with both low VDD_{DD} (∼\sim0.2V) and small LchL_{ch} (∼\sim6nm). In this work, it is shown that scaling TFETs in general requires scaling down the bandgap EgE_g and scaling up the effective mass m∗m^* for high performance. Quantitatively, a channel material with an optimized bandgap (Eg∼1.2qVDD[eV]E_g\sim1.2qV_{DD} [eV]) and an engineered effective mass (m∗−1∼40VDD2.5[m0−1]m*^{-1}\sim40 V_{DD}^{2.5} [m_0^{-1}]) makes both VDDV_{DD} and LchL_{ch} scaling feasible with the scaling rule of Lch/VDD=30 nm/VL_{ch}/V_{DD}=30~nm/V for LchL_{ch} from 15nm to 6nm and corresponding VDDV_{DD} from 0.5V to 0.2V.

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