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Source author record

Weiwei Luo

Weiwei Luo appears in the imported research catalog. Authorship, coauthor and topic links are available while profile ownership is still unclaimed.

ResearcherUnclaimed source record
cond-mat.mes-hallcond-mat.mtrl-scimath.DSphysics.optics

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Published work

4 published item(s)

preprint2023arXiv

Characteristic lengthscales of the electrically-induced insulator-to-metal transition

Some correlated materials display an insulator-to-metal transition as the temperature is increased. In most cases this transition can also be induced electrically, resulting in volatile resistive switching due to the formation of a conducting filament. While this phenomenon has attracted much attention due to potential applications, many fundamental questions remain unaddressed. One of them is its characteristic lengths: what sets the size of these filaments, and how does this impact resistive switching properties. Here we use a combination of wide-field and scattering-type scanning near-field optical microscopies to characterize filament formation in NdNiO3 and SmNiO3 thin films. We find a clear trend: smaller filaments increase the current density, yielding sharper switching and a larger resistive drop. With the aid of numerical simulations, we discuss the parameters controlling the filament width and, hence, the switching properties.

0 citations0 reviewsNo code linkedOpen access
preprint2020arXiv

Electronic transport in sub-micrometric channels at the LaAlO$_{3}$/SrTiO$_{3}$ interface

Nanoscale channels realized at the conducting interface between LaAlO$_{3}$ and SrTiO$_{3}$ provide a perfect playground to explore the effect of dimensionality on the electronic properties of complex oxides. Here we compare the electric transport properties of devices realized using the AFM-writing technique and conventional photo-lithography. We find that the lateral size of the conducting paths has a strong effect on their transport behavior at low temperature. We observe a crossover from metallic to insulating regime occurring at about 50 K for channels narrower than 100 nm. The insulating upturn can be suppressed by the application of a positive backgate. We compare the behavior of nanometric constrictions in lithographically patterned channels with the result of model calculations and we conclude that the experimental observations are compatible with the physics of a quantum point contact.

0 citations0 reviewsNo code linkedOpen access
preprint2016arXiv

Improved Razumikhin and Krasovskii Stability Criteria for Time-Varying Stochastic Time-Delay Systems

The problem of p-th moment stability for time-varying stochastic time-delay systems with Markovian switching is investigated in this paper. Some novel stability criteria are obtained by applying the generalized Razumikhin and Krasovskii stability theorems. Both p-th moment asymptotic stability and (integral) input-to-state stability are considered based on the notion and properties of uniformly stable functions and the improved comparison principles. The established results show that time-derivatives of the constructed Razumikhin functions and Krasovskii functionals are allowed to be indefinite, which improve the existing results on this topic. By applying the obtained results for stochastic systems, we also analyze briefly the stability of time-varying deterministic time-delay systems. Finally, examples are provided to illustrate the effectiveness of the proposed results.

0 citations0 reviewsNo code linkedOpen access
preprint2016arXiv

Tailoring reflection of graphene plasmons by focused ion beams

Graphene plasmons are of remarkable features that make graphene plasmon elements promising for applications to integrated photonic devices. The fabrication of graphene plasmon components and control over plasmon propagating are of fundamental important. Through near-field plasmon imaging, we demonstrate controllable modifying of the reflection of graphene plasmon at boundaries etched by ion beams. Moreover, by varying ion dose at a proper value, nature like reflection boundary can be obtained. We also investigate the influence of ion beam incident angle on plasmon reflection. To illustrate the application of ion beam etching, a simple graphene wedge-shape plasmon structure is fabricated and performs excellently, proving this technology as a simple and efficient tool for controlling graphene plasmons.

0 citations0 reviewsNo code linkedOpen access