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Wei-Jun Fan

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2 publications

preprint2020arXiv

Strain effects on Phase-Filling Singularities in Highly Doped n-Type Ge

Recently, Chi Xu et al. predicted the phase-filling singularities (PFS) in the optical dielectric function (ODF) of the highly doped nn-type Ge and confirmed in experiment the PFS associated E1+Δ1E_{1}+Δ_{1} transition by advanced \textit{in situ} doping technology [Phys. Rev. Lett. 118, 267402 (2017)], but the strong overlap between E1E_{1} and E1+Δ1E_{1}+Δ_{1} optical transitions made the PFS associated E1E_{1} transition that occurs at the high doping concentration unobservable in their measurement. In this work, we investigate the PFS of the highly doped n-type Ge in the presence of the uniaxial and biaxial tensile strain along [100], [110] and [111] crystal orientation. Compared with the relaxed bulk Ge, the tensile strain along [100] increases the energy separation between the E1E_{1} and E1+Δ1E_{1}+Δ_{1} transition, making it possible to reveal the PFS associated E1E_{1} transition in optical measurement. Besides, the application of tensile strain along [110] and [111] offers the possibility of lowering the required doping concentration for the PFS to be observed, resulting in new additional features associated with E1+Δ1E_{1}+Δ_{1} transition at inequivalent LL-valleys. These theoretical predications with more distinguishable optical transition features in the presence of the uniaxial and biaxial tensile strain can be more conveniently observed in experiment, providing new insights into the excited states in heavily doped semiconductors.

preprint2016arXiv

Resonant impurities states-driven topological transition in quantum well

We demonstrate theoretically that a new system quantum well can realize the topological transition based on the 16-band kp model. Utilizing the strain introduced by the doped impurities, the band anti crossing induced by the doped nitrogen and valence band anti crossing induced by the doped bismuth, the band gap of the quantum well is rapidly decreased and even becomes negative. As a result, the topological transitions arise. Furthermore, the band gap as a function of the concentration of nitrogen and bismuth is calculated, where the negative gap corresponds to the topological phase. Noting the cancel of strain resulting from the combination of tensile strain introduced by N and strain introduced by Bi, we can easily tune the ratio of the N and Bi to meet the requirement of strain in the crystal growth procedure. Our proposal provides a promising approach for topological insulator in traditional semiconductor system utilizing the semiconductor fabrication technologies.

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