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Researcher profile

Vladimir Protasenko

Vladimir Protasenko contributes to research discovery and scholarly infrastructure.

ResearcherAffiliation not importedOpen to collaborate
cond-mat.mtrl-sciphysics.app-phphysics.optics

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Published work

3 published item(s)

preprint2025arXiv

Edge emission from 265~nm UV-C LEDs grown by MBE on bulk AlN

UV-C LEDs pseudomorphically grown by MBE on bulk AlN substrates emitting at 265 nm are demonstrated. High current density up to 800 A/cm$^2$, 5 orders of on/off ratio, and low differential on-resistance of 2.6 m$Ω\cdot$cm$^2$ at the highest current density is achieved. The LED heterostructure has a high refractive index waveguide core surrounded by n- and p-cladding layers similar to a laser diode designed for mode confinement at 270 nm to facilitate edge emission and collection of photons. Edge-emitting devices are made by cleaving the fabricated LEDs along the $m$-plane of the wurtzite crystal. Electrical injection results in emission of high energy 4.7 eV photons that are collected from the cleaved edge of the LEDs corresponding to the optical bandgap of the AlGaN active region. The contribution of power dissipation across the n- and p-regions of the diode is discussed. The n-contact resistance to n-AlGaN is identified as the largest contributor to the series resistance of the LED in the present generation of devices.

0 citations0 reviewsNo code linkedOpen access
preprint2022arXiv

Molecular beam homoepitaxy of N-polar AlN: enabling role of Al-assisted surface cleaning

N-polar aluminum nitride (AlN) is an important building block for next-generation high-power RF electronics. We report successful homoepitaxial growth of N-polar AlN by molecular beam epitaxy (MBE) on large-area cost-effective N-polar AlN templates. Direct growth without any in-situ surface cleaning leads to films with inverted Al-polarity. It is found that Al-assisted cleaning before growth enables the epitaxial film to maintain N-polarity. The grown N-polar AlN epilayer with its smooth, pit-free surface duplicates the structural quality of the substrate as evidenced by a clean and smooth growth interface with no noticeable extended defects generation. Near band-edge photoluminescence peaks are observed at room temperature on samples with MBE-grown layers but not on the bare AlN substrates, implying the suppression of non-radiative recombination centers in the epitaxial N-polar AlN. These results are pivotal steps towards future high-power RF electronics and deep ultraviolet photonics based on the N-polar AlN platform.

0 citations0 reviewsNo code linkedOpen access
preprint2020arXiv

Crystal orientation dictated epitaxy of ultrawide bandgap 5.4-8.6 eV $α$-(AlGa)$_2$O$_3$ on m-plane sapphire

Ultra-wide bandgap semiconductors are ushering in the next generation of high power electronics. The correct crystal orientation can make or break successful epitaxy of such semiconductors. Here it is discovered that single-crystalline layers of $α$-(AlGa)$_2$O$_3$ alloys spanning bandgaps of 5.4 - 8.6 eV can be grown by molecular beam epitaxy. The key step is found to be the use of m-plane sapphire crystal. The phase transition of the epitaxial layers from the $α$- to the narrower bandgap $β$-phase is catalyzed by the c-plane of the crystal. Because the c-plane is orthogonal to the growth front of the m-plane surface of the crystal, the narrower bandgap pathways are eliminated, revealing a route to much wider bandgap materials with structural purity. The resulting energy bandgaps of the epitaxial layers span a range beyond the reach of all other semiconductor families, heralding the successful epitaxial stabilization of the largest bandgap materials family to date.

0 citations0 reviewsNo code linkedOpen access