Researcher profile

Vladimir Manucharyan

Vladimir Manucharyan contributes to research discovery and scholarly infrastructure.

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Published work

2 published item(s)

preprint2022arXiv

Microwave cavity-free hole burning spectroscopy of Er$^{3+}$:Y$_2$SiO$_5$ at millikelvin temperatures

Efficient quantum memory is of paramount importance for long-distance quantum communications, as well as for complex large-scale computing architectures. We investigate the capability of Er$^{3+}$:Y$_2$SiO$_5$ crystal to serve as a quantum memory for the travelling microwave photons by employing techniques developed for dense optical ensembles. In our efforts to do so, we have performed high-resolution microwave spectroscopy of Er$^{3+}$:Y$_2$SiO$_5$, where we identified electronic spin as well as hyperfine transitions. Furthermore, we have explored spectral hole burning technique and studied the spin relaxation process at millikelvin temperatures, determined the main relaxation mechanisms, which lay the groundwork for further studies of the topic.

preprint2020arXiv

Superconducting TiN films grown by directional reactive evaporation

We report a novel method of growing strongly-disordered superconducting titanium nitride (TiN) thin films by reactive electron-beam deposition. The normal state sheet resistance and superconducting critical temperature (Tc) can be tuned by controlling the deposition pressure in the range of 1.1*10^-6 to 3.1*10^-5 mbar} and film thickness d from 10nm to 300nm. For 10nm thick films, the sheet resistance reaches 1361 Ω/\square and T_c = 0.77K, which translates into an estimate for the sheet inductance as large as L_\square = 2.4nH/\square. Benefiting from the directionality of reactive evaporation, we fabricated RF test devices with micron-sized dimensions using a resist mask and a lift-off process, which would be impossible with sputtering or atomic layer deposition methods. The spectroscopic measurements result in consistent sheet inductance values in two different device geometries and the quality factors ranged from Q = 300-2200. The loss is likely due to the presence of titanium oxynitride in the morphological composition of our films. The flexibility of the lift-off process suggest applications of reactively-evaporated TiN for making supporting structures around quantum circuits, such as readout resonators or compact on-chip filters.