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Shoichi Sato appears in the imported research catalog. Authorship, coauthor and topic links are available while profile ownership is still unclaimed.
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Department of Electrical Engineering and Information Systems, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan Center for Spintronics Research Network (CSRN), The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan
We have experimentally and theoretically investigated the electron spin transport and spin distribution at room temperature in a Si two-dimensional (2D) inversion channel of back-gate-type spin metal-oxide-semiconductor field-effect transistors (spin MOSFETs). The magnetoresistance ratio of the spin MOSFET with a channel length of 0.4$μ$m was increased by a factor of 6 from that in our previous paper [Phys. Rev. B 99, 165301 (2019)] by lowering the parasitic resistances at the source/drain junctions with highly-phosphorus-doped n+-Si regions and by increasing the lateral electric field in the channel along the electron transport, called "spin drift". Clear Hanle signals with some oscillation peaks were observed for the spin MOSFET with a channel length of 10 $μ$ m under the lateral electric field, indicating that the effective spin diffusion length is dramatically enhanced by the spin drift. By taking into account the n+-Si regions and the spin drift in the channel, one-dimensional analytic functions were derived for analyzing the effect of the spin drift on the spin transport through the channel and these functions were found to explain almost all the experimental results. From the calculated spin current and spin distribution, it was revealed that almost all the spins are unflipped during the spin-drift-assisted transport through the 0.4-$μ$m-long inversion channel, but the most part of the injected spins from the source electrode are relaxed in the n+-Si regions of both the source and drain junctions. This means that the spin drift is useful and precise design of the device structure is essential to obtain a higher magnetoresistance ratio. Furthermore, we showed that the effective spin resistances that are introduced in this study are very helpful to understand how to improve the magnetoresistance ratio of spin MOSFETs for practical use.
Group-IV-based ferromagnetic semiconductor Ge1-xFex (GeFe) is one of the most promising materials for efficient spin injectors and detectors for Si and Ge. Recent first principles calculations (Sakamoto et al., Ref. 9) suggested that the Fermi level is located in two overlapping largely spin-polarized bands formed in the bandgap of GeFe; spin-down d(e) band and spin-up p-d(t2) band. Thus, it is important to clarify how these bands contribute to spin injection and detection. In this study, we show the first successful observation of the tunneling magnetoresistance (TMR) in magnetic tunnel junctions (MTJs) containing a group-IV ferromagnetic semiconductor, that is, in MTJs composed of epitaxially grown Fe/MgO/Ge0.935Fe0.065. We find that the p-d(t2) band in GeFe is mainly responsible for the tunneling transport. Although the obtained TMR ratio is small (0.3%), the TMR ratio is expected to be enhanced by suppressing leak current through amorphous-like crystal domains observed in MgO.
We have investigated the influence of anisotropic magnetoresistance (AMR) on nonlocal signals in Si-based multi-terminal devices with ferromagnetic Fe electrodes. The AMR of the Fe electrodes was found to have a significant influence on nonlocal signals when the in-plane device structure is not optimized. Moreover, realization of a pure spin current by spin diffusion was found to be virtually impossible because of the electric potential distribution in the depth direction in the Si channel. Although apparent signals indicating the spin-valve effect were not detected, we mainly present structural influence on the electric potential distribution which is indispensable for the analyses of spin-dependent transport.