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Researcher profile

Sayeef Salahuddin

Sayeef Salahuddin contributes to research discovery and scholarly infrastructure.

ResearcherAffiliation not importedOpen to collaborate
cond-mat.mes-hallphysics.app-phcond-mat.mtrl-sciOther Computer Science

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Published work

4 published item(s)

preprint2022arXiv

Innovating at Speed and at Scale: A Next Generation Infrastructure for Accelerating Semiconductor Technologies

Semiconductor innovation drives improvements to technologies that are critical to modern society. The country that successfully accelerates semiconductor innovation is positioned to lead future semiconductor-driven industries and benefit from the resulting economic growth. It is our view that a next generation infrastructure is necessary to accelerate and enhance semiconductor innovation in the U.S. In this paper, we propose such an advanced infrastructure composed of a national network of facilities with enhancements in technology and business models. These enhancements enable application-driven and challenge-based research and development, and ensure that facilities are accessible and sustainable. The main tenets are: a challenge-driven operational model, a next-generation infrastructure to serve that operational model, technology innovations needed for advanced facilities to speed up learning cycles, and innovative cost-effective business models for sustainability. Ultimately, the expected outcomes of such a participatory, scalable, and sustainable nation-level advanced infrastructure will have tremendous impact on government, industry, and academia alike.

0 citations0 reviewsNo code linkedOpen access
preprint2020arXiv

Anomalous Subthreshold Behaviors in Negative Capacitance Transistors

Recent measurements on ultra-thin body Negative Capacitance Field Effect Transistors have shown subthreshold behaviors that are not expected in a classical MOSFET. Specifically, subthreshold swing was found to decrease with increased gate bias in the subthreshold region for devices measured over multiple gate lengths down to 30 nm. In addition, improvement in the subthreshold swing relative to control devices showed a non-monotonic dependence on the gate length. In this paper, using a Landau-Khanatnikov ferroelectric gate stack model calibrated with measured Capacitance-Voltage, we show that both these anomalous behaviors can be quantitatively reproduced with TCAD simulations.

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preprint2020arXiv

One nanometer HfO$_2$-based ferroelectric tunnel junctions on silicon

In ferroelectric materials, spontaneous symmetry breaking leads to a switchable electric polarization, which offers significant promise for nonvolatile memories. In particular, ferroelectric tunnel junctions (FTJs) have emerged as a new resistive switching memory which exploit polarization-dependent tunnel current across a thin ferroelectric barrier. Here we demonstrate FTJs with CMOS-compatible Zr-doped HfO$_2$ (Zr:HfO$_2$) ferroelectric barriers of just 1 nm thickness, grown by atomic layer deposition on silicon. These 1 nm Zr:HfO$_2$ tunnel junctions exhibit large polarization-driven electroresistance (19000$\%$), the largest value reported for HfO$_2$-based FTJs. In addition, due to just a 1 nm ferroelectric barrier, these junctions provide large tunnel current (> 1 A/cm$^2$) at low read voltage, orders of magnitude larger than reported thicker HfO$_2$-based FTJs. Therefore, our proof-of-principle demonstration provides an approach to simultaneously overcome three major drawbacks of prototypical FTJs: a Si-compatible ultrathin ferroelectric, large electroresistance, and large read current for high-speed operation.

0 citations0 reviewsNo code linkedOpen access
preprint2020arXiv

Spin-orbit torque generated by amorphous Fe$_{x}$Si$_{1-x}$

While tremendous work has gone into spin-orbit torque and spin current generation, charge-to-spin conversion efficiency remains weak in silicon to date, generally stemming from the low spin-orbit coupling (low atomic number, Z) and lack of bulk lattice inversion symmetry breaking. Here we report the observation of spin-orbit torque in an amorphous, non-ferromagnetic Fe$_{x}$Si$_{1-x}$ / cobalt bilayer at room temperature, using spin torque ferromagnetic resonance and harmonic Hall measurements. Both techniques provide a minimum spin torque efficiency of about 3 %, comparable to prototypical heavy metals such as Pt or Ta. According to the conventional theory of the spin Hall effect, a spin current in an amorphous material is not expected to have any substantial contribution from the electronic bandstructure. This, combined with the fact that Fe$_{x}$Si$_{1-x}$ does not contain any high-Z element, paves a new avenue for understanding the underlying physics of spin-orbit interaction and opens up a new class of material systems - silicides - that is directly compatible with complementary metal-oxide-semiconductor (CMOS) processes for integrated spintronics applications.

0 citations0 reviewsNo code linkedOpen access