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Researcher profile

Prachi Venkat

Prachi Venkat contributes to research discovery and scholarly infrastructure.

ResearcherAffiliation not importedOpen to collaborate
physics.opticsphysics.app-ph

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Published work

3 published item(s)

preprint2022arXiv

Three-temperature modeling of laser-induced damage process in silicon

Laser excitation in silicon from femto- to pico-second time scales is studied. We assume the Three-Temperature Model (3TM) which describes the dynamics of the distinct quasi-temperatures for electrons, holes, and lattice. Numerical results for damage threshold reproduce the experimental results not only quantitatively, but qualitatively as well, showing dependence on laser pulse duration. Comparison with experimental data suggests that electron emission and thermal melting are both responsible for damage in silicon. We found that electron-phonon relaxation time has a significant effect on pulse duration dependence of electron emission.

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preprint2022arXiv

Wavelength dependence of laser-induced excitation dynamics in silicon

Effect of laser wavelength on the carrier-phonon dynamics and damage threshold of silicon is studied numerically. Laser excitation dynamics in silicon is studied using Three-Temperature Model (3TM). We consider the evolution of electron, hole, and lattice temperatures separately and including band-gap re-normalization effect on optical properties of silicon. Finite Difference Time Domain method is used to model the laser field. Damage threshold calculated using the 3TM is in reasonable agreement with the experiments. Our results indicate that the competition of inter-band excitation, plasma heating, and electron-phonon relaxation process defines the damage threshold for various wavelengths and pulse durations.

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preprint2021arXiv

Electron excitation rate in dielectrics under an intense elliptically polarized laser field

Electron excitation in dielectrics is studied for an elliptically polarized laser field. As the first step, we develop an analytical formula for electron excitation rate under elliptically polarized laser as the extension of our previous work [T.Otobe et. al., JPSJ88(2019) 024709]. In the next step, we calculate the excitation rate depending on the band structure by assuming direction dependence of reduced mass. We find that although the ellipticity decreases the excitation rate significantly in an isotropic system, the energy oscillation of electrons due to the intra-band dynamics in the anisotropic band structure increases the excitation rate with higher ellipticity. Our results indicate that we can control the excitation rate in dielectrics by varying the ellipticity, depending on the band anisotropy.

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