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Oliver Hartwig

Oliver Hartwig contributes to research discovery and scholarly infrastructure.

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Published work

4 published item(s)

preprint2022arXiv

Stacking polymorphism in PtSe$_2$ drastically affects its electromechanical properties

PtSe$_2$ is one of the most promising materials for the next generation of piezoresistive sensors. However, the large-scale synthesis of homogeneous thin films with reproducible electromechanical properties is challenging due to polycrystallinity. We show that stacking phases other than the AA-stacking in the 1T phase become thermodynamically available at elevated temperatures. We show that these can make up a significant fraction in a polycrystalline thin film and discuss methods to characterize these stacking phases. Lastly, we estimate their gauge factors, which vary strongly and significantly impact the performance of a nanoelectromechanical device.

preprint2022arXiv

Two-dimensional Platinum Diselenide Waveguide-Integrated Infrared Photodetectors

Low cost, easily integrable photodetectors (PDs) for silicon (Si) photonics are still a bottleneck for photonic integrated circuits (PICs), especially for wavelengths above 1.8 $μ$m. Multilayered platinum diselenide (PtSe$_2$) is a semi-metallic two-dimensional (2D) material that can be synthesized below 450$°$C. We integrate PtSe$_2$ based PDs directly by conformal growth on Si waveguides. The PDs operate at 1550 nm wavelength with a maximum responsivity of 11 mA/W and response times below 8.4 $μ$s. Fourier transform infrared spectroscopy (FTIR) in the wavelength range from 1.25 $μ$m to 28 $μ$m indicates the suitability of PtSe$_2$ for PDs far into the infrared wavelength range. Our PtSe$_2$ PDs integrated by direct growth outperform PtSe$_2$ PDs manufactured by standard 2D layer transfer. The combination of IR responsivity, chemical stability, selective and conformal growth at low temperatures, and the potential for high carrier mobility, make PtSe$_2$ an attractive 2D material for optoelectronics and PICs.

preprint2020arXiv

Spectroscopic thickness and quality metrics for PtSe$_2$ layers produced by top-down and bottom-up techniques

Thin films of noble-metal-based transition metal dichalcogenides, such as PtSe$_2$, have attracted increasing attention due to their interesting layer-number dependent properties and application potential. While it is difficult to cleave bulk crystals down to mono- and few-layers, a range of growth techniques have been established producing material of varying quality and layer number. However, to date, no reliable high-throughput characterization to assess layer number exists. Here, we use top-down liquid phase exfoliation (LPE) coupled with centrifugation to produce widely basal plane defect-free PtSe$_2$ nanosheets of varying sizes and thicknesses. Quantification of the lateral dimensions by statistical atomic force microscopy allows us to quantitatively link information contained in optical spectra to the dimensions. For LPE nanosheets we establish metrics for lateral size and layer number based on extinction spectroscopy. Further, we compare the Raman spectroscopic response of LPE nanosheets with micromechanically exfoliated PtSe$_2$, as well as thin films produced by a range of bottom up techniques. We demonstrate that the Eg1 peak position and the intensity ratio of the Eg1/ A1g1 peaks can serve as robust metric for layer number across all sample types and will be of importance in future benchmarking of PtSe$_2$ films.

preprint2020arXiv

Three-dimensional printing of silica-glass structures with submicrometric features

Humanity's interest in manufacturing silica-glass objects extends back over three thousand years. Silica glass is resistant to heating and exposure to many chemicals, and it is transparent in a wide wavelength range. Due to these qualities, silica glass is used for a variety of applications that shape our modern life, such as optical fibers in medicine and telecommunications. However, its chemical stability and brittleness impede the structuring of silica glass, especially on the small scale. Techniques for three-dimensional (3D) printing of silica glass, such as stereolithography and direct ink writing, have recently been demonstrated, but the achievable minimum feature size is several tens of micrometers. While submicrometric silica-glass structures have many interesting applications, for example in micro-optics, they are currently manufactured using lithography techniques, which severely limits the 3D shapes that can be realized. Here, we show 3D printing of optically transparent silica-glass structures with submicrometric features. We achieve this by cross-linking hydrogen silsesquioxane to silica glass using nonlinear absorption of laser light followed by the dissolution of the unexposed material. We print a functional microtoroid resonator with out-of-plane fiber couplers to demonstrate the new possibilities for designing and building silica-glass microdevices in 3D.