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Navakanta Bhat

Navakanta Bhat appears in the imported research catalog. Authorship, coauthor and topic links are available while profile ownership is still unclaimed.

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cond-mat.mes-hallcond-mat.mtrl-scicond-mat.dis-nnEmerging TechnologiesNeurons and Cognition

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Published work

14 published item(s)

preprint2022arXiv

Self-assembled neuromorphic networks at self-organized criticality in Ag-hBN platform

Networks and systems which exhibit brain-like behavior can analyze information from intrinsically noisy and unstructured data with very low power consumption. Such characteristics arise due to the critical nature and complex interconnectivity of the brain and its neuronal network. We demonstrate that a system comprising of multilayer hexagonal Boron Nitride (hBN) films contacted with Silver (Ag), that can uniquely host two different self-assembled networks, which are self-organized at criticality (SOC). This system shows bipolar resistive switching between high resistance (HRS) and low resistance states (LRS). In the HRS, Ag clusters (nodes) intercalate in the van der Waals gaps of hBN forming a network of tunnel junctions, whereas the LRS contains a network of Ag filaments. The temporal avalanche dynamics in both these states exhibit power-law scaling, long-range temporal correlation, and SOC. These networks can be tuned from one to another with voltage as a control parameter. For the first time, different neuron-like networks are realized in a single CMOS compatible, 2D materials platform.

0 citations0 reviewsNo code linkedOpen access
preprint2016arXiv

Photoresponse of atomically thin MoS2 layers and their planar heterojunctions

MoS2 monolayers exhibit excellent light absorption and large thermoelectric power, which are, however, accompanied with very strong exciton binding energy - resulting in complex photoresponse characteristics. We study the electrical response to scanning photo-excitation on MoS2 monolayer (1L) and bilayer (2L) devices, and also on monolayer/bilayer (1L/2L) planar heterojunction and monolayer/few-layer/multi-layer (1L/FL/ML) planar double heterojunction devices to unveil the intrinsic mechanisms responsible for photocurrent generation in these materials and junctions. Strong photoresponse modulation is obtained by scanning the position of the laser spot, as a consequence of controlling the relative dominance of a number of layer dependent properties, including (i) photoelectric effect (PE), (ii) photothermoelectric effect (PTE), (iii) excitonic effect, (iv) hot photo-electron injection from metal, and (v) carrier recombination. The monolayer and bilayer devices show peak photoresponse when the laser is focused at the source junction, while the peak position shifts to the monolayer/multi-layer junction in the heterostructure devices. The photoresponse is found to be dependent on the incoming light polarization when the source junction is illuminated, although the polarization sensitivity drastically reduces at the monolayer/multi-layer heterojunction. Finally, we investigate laser position dependent transient response of photocurrent to reveal trapping of carriers in SiO2 at the source junction is the critical factor to determine the transient response in 2D photodetectors, and also show that, by systematic device design, such trapping can be avoided in the heterojunction devices, resulting in fast transient response. The insights obtained will play an important role in designing fast 2D TMDs based photodetector and related optoelectronic and thermoelectric devices.

0 citations0 reviewsNo code linkedOpen access
preprint2016arXiv

Surface States Engineering of Metal/MoS2 Contacts Using Sulfur Treatment for Reduced Contact Resistance and Variability

Variability and lack of control in the nature of contacts between metal/MoS2 interface is a major bottleneck in the realisation of high-performance devices based on layered materials for several applications. In this letter, we report on the reduction in Schottky barrier height at metal/MoS2 interface by engineering the surface states through sulphur treatment. Electrical characteristics for back-gated MoS2 field effect transistor structures were investigated for two high work-function metal contacts Ni and Pd. Contacts on MoS2 treated with sulphur exhibited significant improvements in Ohmic nature with concomitant reduction in variability compared to those on untreated MoS2 films leading to a 2x increase in extracted mobility. X-ray Photoelectron Spectroscopy (XPS) measurements, Raman Spectroscopy and comparison of threshold voltages indicated absence of additional doping or structural changes due to sulphur treatment. The Schottky barrier heights were extracted from temperature-dependent transfer characteristics based on the thermionic current model. A reduction in barrier height of 80 and 135 meV extracted for Ni/MoS2 and Pd/MoS2 contacts respectively is hence attributed to the increase in surface states (or stronger Fermi level pinning) due to sulphur treatment. The corresponding charge neutrality levels at metal/MoS2 interface, were extracted to be 0.16 eV (0.17 eV) below the conduction band before (after) Sulphur treatment. This first report of surface states engineering in MoS2 leading to superior contacts is expected to significantly benefit the entire class of devices based on layered 2D materials.

0 citations0 reviewsNo code linkedOpen access
preprint2015arXiv

Estimation of background carrier concentration in fully depleted GaN films

Buffer leakage is an important parasitic loss mechanism in AlGaN/GaN HEMTs and hence various methods are employed to grow semi-insulating buffer layers. Quantification of carrier concentration in such buffers using conventional capacitance based profiling techniques is challenging due to their fully depleted nature even at zero bias voltages. We provide a simple and effective model to extract carrier concentrations in fully depleted GaN films using capacitance-voltage (C-V) measurements. Extensive mercury probe C-V profiling has been performed on GaN films of differing thicknesses and doping levels in order to validate this model. Carrier concentrations as extracted from both the conventional C-V technique for partially depleted films having the same doping concentration, and Hall measurements show excellent agreement with those predicted by the proposed model thus establishing the utility of this technique. This model can be readily extended to estimate background carrier concentrations from the depletion region capacitances of HEMT structures and fully depleted films of any class of semiconductor materials.

0 citations0 reviewsNo code linkedOpen access
preprint2015arXiv

Growth Stress Induced Tunability of Dielectric Constant in Thin Films

It is demonstrated here that growth stress has a substantial effect on the dielectric constant of zirconia thin films. The correct combination of parameters - phase, texture and stress - is shown to yield films with high dielectric constant and best reported equivalent oxide thickness of 0.8 nm. The stress effect on dielectric constant is twofold, firstly, by the effect on phase transitions and secondly by the effect on interatomic distances. We discuss and explain the physical mechanisms involved in the interplay between the stress, phase changes and the dielectric constant in detail.

0 citations0 reviewsNo code linkedOpen access
preprint2015arXiv

Optical Phonon Limited High Field Transport in Layered Materials

An optical phonon limited velocity model has been employed to investigate high-field transport in a selection of layered 2D materials for both, low-power logic switches with scaled supply voltages, and high-power, high-frequency transistors. Drain currents, effective electron velocities and intrinsic cut-off frequencies as a function of carrier density have been predicted thus providing a benchmark for the optical phonon limited high-field performance limits of these materials. The optical phonon limited carrier velocities of a selection of transition metal dichalcogenides and black phosphorus are found to be modest as compared to their n-channel silicon counterparts, questioning the utility of these devices in the source-injection dominated regime. h-BN, at the other end of the spectrum, is shown to be a very promising material for high-frequency high-power devices, subject to experimental realization of high carrier densities, primarily due to its large optical phonon energy. Experimentally extracted saturation velocities from few-layer MoS2 devices show reasonable qualitative and quantitative agreement with predicted values. Temperature dependence of measured vsat is discussed and found to fit a velocity saturation model with a single material dependent fit parameter.

0 citations0 reviewsNo code linkedOpen access
preprint2015arXiv

Spotting 2-D Atomic Layers on Aluminum Nitride Thin Films

The availability of large-area substrates imposes an important constraint on the technological and commercial realization of devices made of layered materials. Aluminum nitride films on silicon are shown to be promising candidate materials as large-area substrates for such devices. Herein, the optical contrast of exemplar 2D layers - MoS2and graphene - on AlN films has been investigated as a necessary first step to realize devices on these substrates. Significant contrast enhancements are predicted and observed on AlN films compared to conventional SiO2films. Quantitative estimates of experimental contrast using reflectance spectroscopy show very good agreement with predicted values.

0 citations0 reviewsNo code linkedOpen access
preprint2011arXiv

High On-Off Ratio Bilayer Graphene Complementary Field Effect Transistors

In this paper, we propose a novel S/D engineering for dual-gated Bilayer Graphene (BLG) Field Effect Transistor (FET) using doped semiconductors (with a bandgap) as source and drain to obtain unipolar complementary transistors. To simulate the device, a self-consistent Non-Equilibrium Green's Function (NEGF) solver has been developed and validated against published experimental data. Using the simulator, we predict an on-off ratio in excess of $10^4$ and a subthreshold slope of ~110mV/decade with excellent scalability and current saturation, for a 20nm gate length unipolar BLG FET. However, the performance of the proposed device is found to be strongly dependent on the S/D series resistance effect. The obtained results show significant improvements over existing reports, marking an important step towards bilayer graphene logic devices.

0 citations0 reviewsNo code linkedOpen access
preprint2011arXiv

Underlap Optimization in HFinFET in Presence of Interface Traps

In this work, using 3D device simulation, we perform an extensive gate to source/drain underlap optimization for the recently proposed hybrid transistor, HFinFET, to show that the underlap lengths can be suitably tuned to improve the on-off ratio as well as the subthreshold characteristics in an ultra-short channel n-type device without significant on performance degradation. We also show that the underlap knob can be tuned to mitigate the device quality degradation in presence of interface traps. The obtained results are shown to be very promising when compared against ITRS 2009 performance projections as well as published state of the art planar and non-planar Silicon MOSFET data of comparable gate lengths using standard benchmarking techniques.

0 citations0 reviewsNo code linkedOpen access
preprint2010arXiv

Bandstructure Effects in Ultra-Thin-Body DGFET: A Fullband Analysis

This paper discusses a few unique effects of ultra-thin-body double-gate NMOSFET that are arising from the bandstructure of the thin film Si channel. The bandstructure has been calculated using 10-orbital $sp^3d^5s^*$ tight-binding method. A number of intrinsic properties including band gap, density of states, intrinsic carrier concentration and parabolic effective mass have been derived from the calculated bandstructure. The spatial distributions of intrinsic carrier concentration and $<100>$ effective mass, arising from the wavefunction of different contributing subbands are analyzed. A self-consistent solution of Poisson-Schrodinger coupled equation is obtained taking the full bandstructure into account, which is then applied to an insightful analysis of volume inversion. The spatial distribution of carriers over the channel of a DGFET has been calculated and its effects on effective mass and channel capacitance are discussed.

0 citations0 reviewsNo code linkedOpen access
preprint2010arXiv

Effects of Parasitics and Interface Traps On Ballistic Nanowire FET In The Ultimate Quantum Capacitance Limit

In this paper, we focus on the performance of a nanowire Field Effect Transistor (FET) in the Ultimate Quantum Capacitance Limit (UQCL) (where only one subband is occupied) in the presence of interface traps ($D_{it}$), parasitic capacitance ($C_L$) and source/drain series resistance ($R_{s,d}$) using a ballistic transport model and compare the performance with its Classical Capacitance Limit (CCL) counterpart. We discuss four different aspects relevant to the present scenario, namely, (i) gate voltage dependent capacitance, (ii) saturation of the drain current, (iii) the subthreshold slope and (iv) the scaling performance. To gain physical insights into these effects, we also develop a set of semi-analytical equations. The key observations are: (1) A strongly energy-quantized nanowire shows non-monotonic multiple peak C-V characteristics due to discrete contributions from individual subbands; (2) The ballistic drain current saturates better in the UQCL compared to CCL, both in presence and absence of $D_{it}$ and $R_{s,d}$; (3) The subthreshold slope does not suffer any relative degradation in the UQCL compared to CCL, even with $D_{it}$ and $R_{s,d}$; (4) UQCL scaling outperforms CCL in the ideal condition; (5) UQCL scaling is more immune to $R_{s,d}$, but presence of $D_{it}$ and $C_L$ significantly degrades scaling advantages in the UQCL.

0 citations0 reviewsNo code linkedOpen access
preprint2010arXiv

External Bias Dependent Direct To Indirect Bandgap Transition in Graphene Nanoribbon

In this work, using self-consistent tight-binding calculations, for the first time, we show that a direct to indirect bandgap transition is possible in an armchair graphene nanoribbon by the application of an external bias along the width of the ribbon, opening up the possibility of new device applications. With the help of Dirac equation, we qualitatively explain this bandgap transition using the asymmetry in the spatial distribution of the perturbation potential produced inside the nanoribbon by the external bias. This is followed by the verification of the bandgap trends with a numerical technique using Magnus expansion of matrix exponentials. Finally, we show that the carrier effective masses possess tunable sharp characters in the vicinity of the bandgap transition points.

0 citations0 reviewsNo code linkedOpen access
preprint2010arXiv

HFinFET: A Scalable, High Performance, Low Leakage Hybrid N-Channel FET

In this letter we propose the design and simulation study of a novel transistor, called HFinFET, which is a hybrid of a HEMT and a FinFET, to obtain excellent performance and good off state control. Followed by the description of the design, 3D device simulation has been performed to predict the characteristics of the device. The device has been benchmarked against published state of the art HEMT as well as planar and non-planar Si NMOSFET data of comparable gate length using standard benchmarking techniques.

0 citations0 reviewsNo code linkedOpen access
preprint2010arXiv

Intrinsic Limits of Subthreshold Slope in Biased Bilayer Graphene Transistor

In this work, we investigate the intrinsic limits of subthreshold slope in a dual gated bilayer graphene transistor using a coupled self-consistent Poisson-bandstructure solver. We benchmark the solver by matching the bias dependent bandgap results obtained from the solver against published experimental data. We show that the intrinsic bias dependence of the electronic structure and the self-consistent electrostatics limit the subthreshold slope obtained in such a transistor well above the Boltzmann limit of 60mV/decade at room temperature, but much below the results experimentally shown till date, indicating room for technological improvement of bilayer graphene.

0 citations0 reviewsNo code linkedOpen access