Preferential Orientation Relationships in CaMnO Ruddlesden-Popper thin films
A high-throughput investigation of local epitaxy (called combinatorial substrate epitaxy) was carried out on CaMnO Ruddlesden-Popper thin films of six thicknesses (from 20 to 400 nm), all deposited on isostructural polycrystalline SrTiO substrates. Electron backscatter diffraction revealed grain-over-grain local epitaxial growth for all films, resulting in a single orientation relationship () for each substrate-film grain pair. Two preferred epitaxial accounted for more than 90 \% of all ORs on 300 different microcrystals, based on analyzing 50 grain pairs for each thickness. The unit cell over unit cell ([100][001] [100][001], or ) accounted for approximately 30 \% of each film. The that accounted for 60 \% of each film ([100][001] [100][010], or ) corresponds to a rotation from by 90 about the a-axis. is strongly favored for substrate orientations in the center of the stereographic triangle, and is observed for orientations very close to (001) or to those near the edge connecting (100) and (110). While should be lower in energy, the majority observation of implies kinetic hindrances decrease the frequency of . Persistent grain over grain growth and the absence of variations of the frequencies with thickness implies that the growth competition is finished within the first few \si{\nano\meter}, and local epitaxy persists thereafter during growth.