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K. K. Likharev

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Published work

3 published item(s)

preprint2016arXiv

Sub-1-us, Sub-20-nJ Pattern Classification in a Mixed-Signal Circuit Based on Embedded 180-nm Floating-Gate Memory Cell Arrays

We have designed, fabricated, and successfully tested a prototype mixed-signal, 28x28-binary-input, 10-output, 3-layer neuromorphic network ("MLP perceptron"). It is based on embedded nonvolatile floating-gate cell arrays redesigned from a commercial 180-nm NOR flash memory. The arrays allow precise (~1%) individual tuning of all memory cells, having long-term analog-level retention and low noise. Each array performs a very fast and energy-efficient analog vector-by-matrix multiplication, which is the bottleneck for signal propagation in most neuromorphic networks. All functional components of the prototype circuit, including 2 synaptic arrays with 101,780 floating-gate synaptic cells, 74 analog neurons, and the peripheral circuitry for weight adjustment and I/O operations, have a total area below 1 mm^2. Its testing on the common MNIST benchmark set (at this stage, with a relatively low weight import precision) has shown a classification fidelity of 94.65%, close to the 96.2% obtained in simulation. The classification of one pattern takes less than 1 us time and ~20 nJ energy - both numbers much better than for digital implementations of the same task. Estimates show that this performance may be further improved using a better neuron design and a more advanced memory technology, leading to a >10^2 advantage in speed and a >10^4 advantage in energy efficiency over the state-of-the-art purely digital (GPU and custom) circuits, at classification of large, complex patterns.

preprint2014arXiv

Redesigning Commercial Floating-Gate Memory for Analog Computing Applications

We have modified a commercial NOR flash memory array to enable high-precision tuning of individual floating-gate cells for analog computing applications. The modified array area per cell in a 180 nm process is about 1.5 um^2. While this area is approximately twice the original cell size, it is still at least an order of magnitude smaller than in the state-of-the-art analog circuit implementations. The new memory cell arrays have been successfully tested, in particular confirming that each cell may be automatically tuned, with ~1% precision, to any desired subthreshold readout current value within an almost three-orders-of-magnitude dynamic range, even using an unoptimized tuning algorithm. Preliminary results for a four-quadrant vector-by-matrix multiplier, implemented with the modified memory array gate-coupled with additional peripheral floating-gate transistors, show highly linear transfer characteristics over a broad range of input currents.

preprint2004arXiv

Aluminum Oxide Layers as Possible Components for Layered Tunnel Barriers

We have studied transport properties of Nb/Al/AlOx/Nb tunnel junctions with ultrathin aluminum oxide layers formed by (i) thermal oxidation and (ii) plasma oxidation, before and after rapid thermal post-annealing of the completed structures at temperatures up to 550 deg C. Post-annealing at temperatures above 300 deg C results in a significant decrease of the tunneling conductance of thermally-grown barriers, while plasma-grown barriers start to change only at annealing temperatures above 450 deg C. Fitting the experimental I-V curves of the junctions using the results of the microscopic theory of direct tunneling shows that the annealing of thermally-grown oxides at temperatures above 300 deg C results in a substantial increase of their average tunnel barriers height, from ~1.8 eV to ~2.45 eV, versus the practically unchanged height of ~2.0 eV for plasma-grown layers. This difference, together with high endurance of annealed barriers under electric stress (breakdown field above 10 MV/cm) may enable all-AlOx and SiO2/AlOx layered "crested" barriers for advanced floating-gate memory applications.