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John Philip

John Philip contributes to research discovery and scholarly infrastructure.

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Published work

3 published item(s)

preprint2021arXiv

Magnetotransport in ferromagnetic Fe$_2$Ge semimetallic thin films

Thin films of the ferromagnet Fe$_2$Ge were grown via molecular beam epitaxy, and their electrical and magneto-transport properties measured for the first time. X-ray diffraction and vibrating sample magnetometry measurements confirmed the crystalline ferromagnetic Fe$_2$Ge phase. The observed high temperature maximum in the longitudinal resistivity, as well as the observed suppression of electron-magnon scattering at low temperatures, point to the presence of strong spin polarization in this material. Measurements of the Hall resistivity, $ρ_{xy}$, show contributions from both the ordinary Hall effect and anomalous Hall effect, $ρ_{xy}^{AH}$, from which we determined the charge carrier concentration and mobility. Measurements also show a small negative magnetoresistance in both the longitudinal and transverse geometries. Fe$_2$Ge holds promise as a useful spintronic material, especially for its semiconductor compatibility.

preprint2020arXiv

Molecular beam epitaxy growth of nonmagnetic Weyl semimetal LaAlGe thin film

Here, we report a detailed method of growing LaAlGe, a non-magnetic Weyl semimetal, thin film on silicon(100) substrates by molecular beam epitaxy and their structural and electrical characterizations. 50 nm thick LaAlGe films were deposited and annealed for 16 hours in situ at a temperature 793 K. As-grown high-quality films showed uniform surface topography and near ideal stoichiometry with a body-centered tetragonal crystal structure. Temperature-dependent longitudinal resistivity can be understood with dominant interband s-d electron-phonon scattering in the temperature range 5-40 K. Hall measurements confirmed the semimetallic nature of the films with electron dominated charge carrier density near 7.15*10^21 cm^-3 at 5 K.

preprint2020arXiv

Transport characteristics of type II Weyl semimetal MoTe2 thin films grown by chemical vapor deposition

Theoretical calculations and experimental observations show MoTe2 is a type II Weyl semimetal, along with many members of transition metal dichalcogenides family. We have grown highly crystalline large-area MoTe2 thin films on Si/SiO2 substrates by chemical vapor deposition. Very uniform, continuous, and smooth films were obtained as confirmed by scanning electron microscopy and atomic force microscopy analyses. Measurements of the temperature dependence of longitudinal resistivity and current-voltage characteristics at different temperature are discussed. Unsaturated, positive quadratic magnetoresistance of the as-grown thin films has been observed from 10 K to 200 K. Hall resistivity measurements confirm the majority charge carriers are hole.