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Johannes Ziegler

Johannes Ziegler contributes to research discovery and scholarly infrastructure.

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Published work

2 published item(s)

preprint2020arXiv

Quantum Hall effect and Landau levels in the 3D topological insulator HgTe

We review low and high field magnetotransport in 80 nm-thick strained HgTe, a material that belongs to the class of strong three-dimensional topological insulators. Utilizing a top gate, the Fermi level can be tuned from the valence band via the Dirac surface states into the conduction band and allows studying Landau quantization in situations where different species of charge carriers contribute to magnetotransport. Landau fan charts, mapping the conductivity $ σ_{xx}(V_g, B) $ in the whole magnetic field - gate voltage range, can be divided into six areas, depending on the state of the participating carrier species. Key findings are: (i) the interplay of bulk holes (spin-degenerate) and Dirac surface electrons (non-degenerate), coexisting for $ E_F $ in the valence band, leads to a periodic switching between odd and even filling factors and thus odd and even quantized Hall voltage values. (ii) A similar though less pronounced behavior we found for coexisting Dirac surface and conduction band electrons. (iii) In the bulk gap, quantized Dirac electrons on the top-surface coexist at lower B with non-quantized ones on the bottom side, giving rise to quantum Hall plateau values depending - for a given filling factor - on the magnetic field strength. In stronger $ B $ fields, Landau level separation increases, charge transfer between different carrier species becomes energetically favorable and leads to the formation of a global (i.e. involving top and bottom surface) quantum Hall state. Simulations using the simplest possible theoretical approach are in line with the basic experimental findings, describing correctly the central features of the transitions from classical to quantum transport in the respective areas of our multicomponent charge carrier system.

preprint2010arXiv

Atomically flat single-crystalline gold nanostructures for plasmonic nanocircuitry

Deep subwavelength integration of high-definition plasmonic nanostructures is of key importance for the development of future optical nanocircuitry for high-speed communication, quantum computation and lab-on-a-chip applications. So far the experimental realization of proposed extended plasmonic networks consisting of multiple functional elements remains challenging, mainly due to the multi-crystallinity of commonly used thermally evaporated gold layers. Resulting structural imperfections in individual circuit elements will drastically reduce the yield of functional integrated nanocircuits. Here we demonstrate the use of very large (>100 micron^2) but thin (<80 nm) chemically grown single-crystalline gold flakes, which, after immobilization, serve as an ideal basis for focused-ion beam milling and other top-down nanofabrication techniques on any desired substrate. Using this methodology we obtain high-definition ultrasmooth gold nanostructures with superior optical properties and reproducible nano-sized features over micrometer length scales. Our approach provides a possible solution to overcome the current fabrication bottleneck and to realize high-definition plasmonic nanocircuitry.