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Jan Suffczynski

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cond-mat.mes-hall cond-mat.mtrl-sci

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preprint2015arXiv

Single-color, in situ photolithography marking of individual CdTe/ZnTe Quantum Dots containing a single Mn2+ ion

A simple, single-color method for permanent marking of the position of individual self-assembled semiconductor Quantum Dots (QDs) at cryogenic temperatures is reported. The method combines in situ photolithography with standard micro-photoluminescence spectroscopy. Its utility is proven by a systematic magnetooptical study of a single CdTe/ZnTe QD containing a Mn2+ ion, where a magnetic field of up to 10 T in two orthogonal, Faraday and Voigt, configurations is applied to the same QD. The presented approach can be applied to a wide range of solid state nanoemitters.

preprint2015arXiv

Strong coupling and polariton lasing in Te based microcavities embedding (Cd,Zn)Te quantum wells

We report on properties of an optical microcavity based on (Cd,Zn,Mg)Te layers and embedding (Cd,Zn)Te quantum wells. The key point of the structure design is the lattice matching of the whole structure to MgTe, which eliminates the internal strain and allows one to embed an arbitrary number of unstrained quantum wells in the microcavity. We evidence the strong light-matter coupling regime already for the structure containing a single quantum well. Embedding four unstrained quantum wells results in further enhancement of the exciton-photon coupling and the polariton lasing in the strong coupling regime.

preprint2014arXiv

Angle Dependence of Photonic Enhancement of Magneto-Optical Kerr Effect in DMS Layers

We investigate theoretically an angle dependence of enhancement of polar magneto-optical Kerr effect (MOKE) obtained thanks to a deposition of a paramagnetic Diluted Magnetic Semiconductor (DMS) layer on one-dimensional photonic crystal layer. Our transfer matrix method based calculations conducted for TE and TM polarizations of the incident light predict up to an order of magnitude stronger MOKE for a (Ga,Fe)N DMS layer when implementing the proposed design. The maximum enhancement for TE and TM polarization occurs for the light incidence at the normal and at the Brewster angle, respectively. This indicates a possibility of tuning of the MOKE enhancement by adjustment of the polarization and the incidence angle of the light.