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Iulian Matei

Iulian Matei contributes to research discovery and scholarly infrastructure.

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cond-mat.mes-hall cond-mat.supr-con

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preprint2015arXiv

Kerr coefficients of plasma resonances in Josephson junction chains

We present an experimental and theoretical analysis of the self- and cross-Kerr effect of extended plasma resonances in Josephson junction chains. We calculate the Kerr coefficients by deriving and diagonalizing the Hamiltonian of a linear circuit model for the chain and then adding the Josephson non-linearity as a perturbation. The calculated Kerr-coefficients are compared with the measurement data of a chain of 200 junctions. The Kerr effect manifests itself as a frequency shift that depends linearly on the number of photons in a resonant mode. By changing the input power on a low signal level, we are able to measure this shift. The photon number is calibrated using the self-Kerr shift calculated from the sample parameters. We then compare the measured cross-Kerr shift with the theoretical prediction, using the calibrated photon number.

preprint2012arXiv

Coherent frequency conversion in a superconducting artificial atom with two internal degrees of freedom

By adding a large inductance in a dc-SQUID phase qubit loop, one decouples the junctions' dynamics and creates a superconducting artificial atom with two internal degrees of freedom. In addition to the usual symmetric plasma mode ({\it s}-mode) which gives rise to the phase qubit, an anti-symmetric mode ({\it a}-mode) appears. These two modes can be described by two anharmonic oscillators with eigenstates $\ket{n_{s}}$ and $\ket{n_{a}}$ for the {\it s} and {\it a}-mode, respectively. We show that a strong nonlinear coupling between the modes leads to a large energy splitting between states $\ket{0_{s},1_{a}}$ and $\ket{2_{s},0_{a}}$. Finally, coherent frequency conversion is observed via free oscillations between the states $\ket{0_{s},1_{a}}$ and $\ket{2_{s},0_{a}}$.

preprint2011arXiv

Novel E-beam lithography technique for in-situ junction fabrication: the controlled undercut

We present a novel shadow evaporation technique for the realization of junctions and capacitors. The design by E-beam lithography of strongly asymmetric undercuts on a bilayer resist enables in-situ fabrication of junctions and capacitors without the use of the well-known suspended bridge[1]. The absence of bridges increases the mechanical robustness of the resist mask as well as the accessible range of the junction size, from 0.01 to more than 10000 micron square. We have fabricated Al/AlOx/Al Josephson junctions, phase qubit and capacitors using a 100kV E- beam writer. Although this high voltage enables a precise control of the undercut, implementation using a conventional 20kV E-beam is also discussed. The phase qubit coherence times, extracted from spectroscopy resonance width, Rabi and Ramsey oscillations decay and energy relaxation measurements, are longer than the ones obtained in our previous samples realized by standard techniques. These results demonstrate the high quality of the junction obtained by this controlled undercut technique.