Nanofocusing optics for an X-ray free-electron laser generating an extreme intensity of 100 EW/cm$^2$ using total reflection mirrors
A nanofocusing optical system referred to as $\textit{100 exa}$ for an X-ray free-electron laser (XFEL) was developed to generate an extremely high intensity of 100 EW/cm$^2$ (10$^2$$^0$ W/cm$^2$) using total reflection mirrors. The system is based on Kirkpatrick-Baez geometry, with 250 mm long elliptically figured mirrors optimized for the SPring-8 Angstrom Compact Free-Electron Laser (SACLA) XFEL facility. The nano-precision surface employed is coated with rhodium and offers a high reflectivity of 80%, with a photon energy of up to 12 keV, under total reflection conditions. Incident X-rays on the optics are reflected with a large spatial acceptance of over 900 $μ$m. The focused beam is 210 nm $\times$ 120 nm (full width at half maximum) and was evaluated at a photon energy of 10 keV. The optics developed for $\textit{100 exa}$ efficiently achieved an intensity of 1 $\times$ 10$^2$$^0$ W/cm$^2$ with a pulse duration of 7 fs and a pulse energy of 150 $μ$J (25% of the pulse energy generated at the light source). The experimental chamber, which can provide varied stage arrangements and sample conditions, including vacuum environments and atmospheric pressure helium, was set up with the focusing optics to meet the experimental requirements.