Researcher profile

Gilles Patriarche

Gilles Patriarche contributes to research discovery and scholarly infrastructure.

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Published work

4 published item(s)

preprint2022arXiv

Continuous-Wave Second-Harmonic Generation in Orientation-Patterned GaP Waveguides at Telecom Wavelengths

A new process to produce Orientation-Patterned Gallium Phosphide (OP-GaP) on GaAs with almost perfectly parallel domain boundaries is presented. Taking advantage of the chemical selectivity between phosphides and arsenides, OP-GaP is processed into suspended shallow-ridge waveguides. Efficient Second-Harmonic Generation from Telecom wavelengths is achieved in both Type-I and Type-II polarisation configurations. The highest observed conversion efficiency is \SI{200}{\percent\per\watt\per\centi\meter\squared}, with a bandwidth of \SI{2.67}{\nano\meter} in a \SI{1}{\milli\meter}-long waveguide. The variation of the conversion efficiency with wavelength closely follows a squared cardinal sine function, in excellent agreement with theory, confirming the good uniformity of the poling period over the entire length of the waveguide.

preprint2022arXiv

Wetting of Ga droplets in SiO$_2$/Si cavities: Application to self-assisted GaAs nanowire growth

In this paper we compute and compare the surface energy of various Ga liquid droplets wetting a cylindrical cavity in various configurations. While for some of these configurations the surface energy can be computed explicitely for others numerical computation is needed. Motivated by the results obtained for the cylindrical cavities we explore the case of the more realistic situation, conical cavities. Our results provide a relation between the geometry of the conical cavity and the equilibirum wetting angles of the droplet on the bottom and on the sidewall of the cavity which insure the dewetting of the lateral surface. This is an important result toward the control of the verticality during the nanowire growth by the vapor liquid solid method.

preprint2021arXiv

Dynamic formation of spherical voids crossing linear defects

A predictive model for the evolution of porous Ge layer upon thermal treatment is reported. We represent an idealized etched dislocation core as an axially symmetric elongated hole and computed its dynamics during annealing. Numerical simulations of the shape change of a completely spherical void via surface diffusion have been performed. Simulations and experiments show individual large spherical voids, aligned along the dislocation core. The creation of voids could facilitate interactions between dislocations, enabling the dislocation network to change its connectivity in a way that facilitates the subsequent annihilation of dislocation segments. This confirms that thermally activated processes such as state diffusion of porous materials provide mechanisms whereby the defects are removed or arranged in configurations of lower energy. This model is intended to be indicative, and more detailed experimental characterization of process parameters such as annealing temperature and time, and could estimate the annealing time for given temperatures, or vice versa, with the right parameters.

preprint2009arXiv

Interface roughness transport in THz quantum cascade detectors

Infrared Detectors based on a Quantum Cascade have been proposed to suppress the dark current which is identified as a limiting factor in Quantum Well Infrared Photodetectors. Those detectors have been mostly designed for the 3-5um and 8-12um range of wavelength. For detector operating in the THz range a complete change of regime of transport is expected since the photon energy is lower than the Longitudinal Optical (LO) phonon energy. Using a two dimensional code of transport we have identified Interface Roughness (IR) as the key interaction in such a structure. We have used scanning transmission electron microscopy (STEM) to evaluate the IR parameters (magnitude of the roughness and mean distance between defects) instead of the classical mobility measurements. Finally, we used these parameters to study their influence on the resistance of the device.