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E. A. Schneidmiller

E. A. Schneidmiller contributes to research discovery and scholarly infrastructure.

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Published work

4 published item(s)

preprint2021arXiv

Application of a modified chirp-taper scheme for generation of attosecond pulses in XUV and soft X-ray FELs

Typically, in Self-Amplified Spontaneous Emission Free Electron Laser (SASE FEL) based short-pulse schemes, pulse duration is limited by FEL coherence time. For hard X-ray FELs, coherence time is in a few hundred attosecond range while for XUV and soft X-ray FELs it is in the femtosecond regime. In this paper the modification of so-called chirp-taper scheme is developed that allows to overcome the coherence time barrier. Numerical simulations for XUV and soft X-ray FEL user facility FLASH demonstrate that one can generate a few hundred attosecond long pulses in the wavelength range 2 - 10 nm with peak power reaching hundreds of megawatts. With several thousand pulses per second this can be a unique source for attosecond science.

preprint2012arXiv

Constraints on photon pulse duration from longitudinal electron beam diagnostics at a soft X-ray free-electron laser

The successful operation of X-ray free-electron lasers (FELs), like the Linac Coherent Light Source or the Free-Electron Laser in Hamburg (FLASH), makes unprecedented research on matter at atomic length and ultrafast time scales possible. However, in order to take advantage of these unique light sources and to meet the strict requirements of many experiments in photon science, FEL photon pulse durations need to be known and tunable. This can be achieved by controlling the FEL driving electron beams, and high-resolution longitudinal electron beam diagnostics can be utilized to provide constraints on the expected FEL photon pulse durations. In this paper, we present comparative measurements of soft X-ray pulse durations and electron bunch lengths at FLASH. The soft X-ray pulse durations were measured by FEL radiation pulse energy statistics and compared to electron bunch lengths determined by frequency-domain spectroscopy of coherent transition radiation in the terahertz range and time-domain longitudinal phase space measurements. The experimental results, theoretical considerations, and simulations show that high-resolution longitudinal electron beam diagnostics provide reasonable constraints on the expected FEL photon pulse durations. In addition, we demonstrated the generation of soft X-ray pulses with durations below 50 fs (FWHM) after the implementation of the new uniform electron bunch compression scheme used at FLASH.

preprint2011arXiv

Generation of attosecond soft x-ray pulses in a longitudinal space charge amplifier

A longitudinal space charge amplifier (LSCA), operating in soft x-ray regime, was recently proposed. Such an amplifier consists of a few amplification cascades (focusing channel and chicane) and a short radiator undulator in the end. Broadband nature of LSCA supports generation of few-cycle pulses as well as wavelength compression. In this paper we consider an application of these properties of LSCA for generation of attosecond x-ray pulses. It is shown that a compact and cheap addition to the soft x-ray free electron laser facility FLASH would allow to generate 60 attosecond (FWHM) long x-ray pulses with the peak power at 100 MW level and a contrast above 98%.

preprint2011arXiv

Potential of the FLASH FEL technology for the construction of a kW-scale light source for the next generation lithography

The driving engine of the Free Electron Laser in Hamburg (FLASH) is an L-band superconducting accelerator. It is designed to operate in burst mode with 800 microsecond pulse duration at a repetition rate of 10 Hz. The maximum accelerated beam current during the macropulse is 9 mA. Our analysis shows that the FLASH technology has great potential since it is possible to construct a FLASH like free electron laser operating at the wavelength of 13.5 and 6.8 nanometer with an average power up to 2.6 kW. Such a source meets the physical requirements for the light source for the next generation lithography.