Researcher profile

Chih-Yuan Wu

Chih-Yuan Wu contributes to research discovery and scholarly infrastructure.

ResearcherAffiliation not importedOpen to collaborate

Trust snapshot

Quick read

Trust 13 - UnverifiedVerification L1Unclaimed author
2works
0followers
3topics
4close collaborators

Actions

Decide how to stay connected

Follow researcher0

Identity and collaboration

How to connect with this researcher

Claiming links this public author record to a researcher profile and unlocks direct collaboration workflows.

Log in to claim

Direct collaboration

Open a focused conversation when the fit is right

Claim this author entity first to unlock direct invitations.

Research graph

See the researcher in context

Open full explorer

Inspect adjacent work, topics, institutions and collaborators without jumping out to a separate graph page.

Building this graph slice

BZPEER is loading the nearby papers, people, topics and institutions for this page.

Published work

2 published item(s)

preprint2012arXiv

Electron dephasing in homogeneous and inhomogeneous indium tin oxide thin films

The electron dephasing processes in two-dimensional homogeneous and inhomogeneous indium tin oxide thin films have been investigated in a wide temperature range 0.3--90 K. We found that the small-energy-transfer electron-electron ($e$-$e$) scattering process dominated the dephasing from a few K to several tens K. At higher temperatures, a crossover to the large-energy-transfer $e$-$e$ scattering process was observed. Below about 1--2 K, the dephasing time $τ_φ$ revealed a very weak temperature dependence, which intriguingly scaled approximately with the inverse of the electron diffusion constant $D$, i.e., $τ_φ(T \approx 0.3 \, {\rm K}) \propto 1/D$. Theoretical implications of our results are discussed. The reason why the electron-phonon relaxation rate is negligibly weak in this low-carrier-concentration material is presented.

preprint2011arXiv

Electrical conduction processes in ZnO in a wide temperature range 20--500 K

We have investigated the electrical conduction processes in as-grown and thermally cycled ZnO single crystal as well as as-grown ZnO polycrystalline films over the wide temperature range 20--500 K. In the case of ZnO single crystal between 110 and 500 K, two types of thermal activation conduction processes are observed. This is explained in terms of the existence of both shallow donors and intermediately deep donors which are consecutively excited to the conduction band as the temperature increases. By measuring the resistivity $ρ(T)$ of a given single crystal after repeated thermal cycling in vacuum, we demonstrate that oxygen vacancies play an important role in governing the shallow donor concentrations but leave the activation energy ($\simeq27\pm$2 meV) largely intact. In the case of polycrystalline films, two types of thermal activation conduction processes are also observed between $\sim$150 and 500 K. Below $\sim$150 K, we found an additional conduction process due to the nearest-neighbor-hopping conduction mechanism which takes place in the shallow impurity band. As the temperatures further decreases below $\sim$80 K, a crossover to the Mott variable-range-hopping conduction process is observed. Taken together with our previous measurements on $ρ(T)$ of ZnO polycrystalline films in the temperature range 2--100 K [Y. L. Huang {\it et al.}, J. Appl. Phys. \textbf{107}, 063715 (2010)], this work establishes a quite complete picture of the overall electrical conduction mechanisms in the ZnO material from liquid-helium temperatures up to 500 K.