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Amretashis Sengupta

Amretashis Sengupta appears in the imported research catalog. Authorship, coauthor and topic links are available while profile ownership is still unclaimed.

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cond-mat.mes-hallcond-mat.mtrl-sci

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Published work

8 published item(s)

preprint2021arXiv

Lithium adsorption properties of monolayer B$_5$Se

B$_5$Se this work we investigate the Li adsorption properties of a hybrid 2D material, namely monolayer B5Se with first principles calculations. 2 dimensional B$_5$Se was found to have a distorted hexagonal structure with five B atoms and one Se atom at the vertices of each hexagon. The density functional theory (DFT) calculations are performed with the generalized gradient approximation (GGA) and Perdew-Burke-Ernzerhoff (PBE) exchange correlation functional. The results were inclusive of van der Waals corrections with Grimmes DFT-D2 scheme. Electrode performance metrics, as the most preferred adsorption sites and adsorption energies, open circuit anode potentials, charge density differences and specific capacities for varying adatom coverage were evaluated with the DFT calculations. The adatom diffusion barriers were evaluated with a nudged elastic band (NEB) method. The ab-initio calculations predict a maximum theoretical specific capacity of 1486.87 mAhg$^{-1}$ for Li adsorption on 2D B$_5$Se, which is over four times that of conventional Li ion battery anode materials. This coupled with an open circuit anode potential of 0.291-0.179V for different degrees of Li coverage, and a small Li diffusion barrier of 0.15eV, metallic nature of the sheet under pure and lithiated conditions and good charge density variations, make monolayer B$_5$Se a potent anode material for Li-ion battery applications.

0 citations0 reviewsNo code linkedOpen access
preprint2019arXiv

Electronic and optical properties of SnX2(X=S, Se)-InSe van der Waals heterostructures from first- principle calculations

In this work from first-principles simulations we investigate bilayer van der Waals heterostructures (vdWh) of emerging 2-dimensional (2D) optical materials SnS 2 and SnSe 2 with monolayer InSe. With density functional theory (DFT) calculations, we study the structural, electronic, optical and carrier transport properties of the SnX 2 (X=S,Se)-InSe vdWh. Calculations show SnX 2 -InSe in its most stable stacking form (named AB-1) to be a material with a small (0.6- 0.7eV) indirect band-gap. The bilayer vdWh shows broad spectrum optical response, with number of peaks in the infra-red to visible region. In terms of carrier transport properties, asymmetry in conductance was observed with respect to the transport direction and electron and hole transmission. The findings are promising from the viewpoint of nanoelectronics and photonics.

0 citations0 reviewsNo code linkedOpen access
preprint2015arXiv

Analysis of Vacancy defects in Hybrid Graphene-Boron Nitride Armchair Nanoribbon based n-MOSFET at Ballistic Limit

Here, we report the performance of vacancy affected supercell of a hybrid Graphene-Boron Nitride embedded armchair nanoribbon (a-GNR-BN) based n-MOSFET at its ballistic transport limit using Non Equilibrium Green's Function (NEGF) methodology. A supercell is made of the 3p configuration of armchair nanoribbon that is doped on the either side with 6 BN atoms and is also H-passivated. The type of vacancies studied are mono (B removal), di (B and N atom removal) and hole (removal of 6 atoms) formed all at the interface of carbon and BN atoms. Density Functional Theory (DFT) is employed to evaluate the material properties of this supercell like bandgap, effective mass and density of states (DOS). Further band gap and effective mass are utilized in self-consistent PoissonSchrodinger calculator formalized using NEGF approach. For all the vacancy defects, material properties show a decrease which is more significant for hole defects. This observation is consistent in the device characteristics as well where ON-current (ION ) and Sub Threshold Slope (SS) shows the maximum increment for hole vacancy and increase is more significant becomes when the number of defects increase.

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preprint2014arXiv

Effect of line defects on the electrical transport properties of monolayer MoS$_{2}$ sheet

We present a computational study on the impact of line defects on the electronic properties of monolayer MoS2. Four different kinds of line defects with Mo and S as the bridging atoms, consistent with recent theoretical and experimental observations are considered herein. We employ the density functional tight-binding (DFTB) method with a Slater-Koster type DFTB-CP2K basis set for evaluating the material properties of perfect and the various defective MoS2 sheets. The transmission spectra is computed with a DFTB-Non-Equilibrium Greens Function (NEGF) formalism. We also perform a detailed analysis of the carrier transmission pathways under a small bias and investigate the phase shifts in the transmission eigenstates of the defective MoS2 sheets. Our simulations show a 2-4 folds decrease in carrier conductance of MoS2 sheets in the presence of line defects as compared to that for the perfect sheet.

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preprint2013arXiv

Impact of intrinsic deformations on the negative differential resistance of monolayer MoS$_2$ ultra-short channel MOSFET

In this work we present a study on the impact of various intrinsic deformations like ripples, twist, wrap on the electronic properties of ultra-short monolayer MoS2 channels. The effect of deformation (3-7o twist or wrap and 0.3-0.7 buckling amplitude) on a 3.5 nm planar monolayer MoS2 MOSFET is evaluated by the density functional theory and the non-equilibrium Green`s function (DFT-NEGF) approach. We study the channel density of states, transmission spectra and the ID-VD characteristics under the varying conditions, with focus on the negative differential resistance (NDR) behavior. Our results show significant change in the NDR peak to valley ratio (PVR) and the NDR window with such minor intrinsic deformations, especially with the rippling.

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preprint2013arXiv

Negative differential resistance and effect of defects and deformations in MoS2 armchair nanoribbon MOSFET

In this work we present a study on the negative differential resistance behavior and the impact of various deformations {like ripples, twist, wrap} and defects like vacancies and edge roughness on the electronic properties of short-channel MoS2 armchair nanoribbon MOSFETs. The effect of deformation {3 to 7 degree twist or wrap and 0.3 to 0.7 Ang rippling amplitude} and defects on a 10 nm MoS2 ANR FET is evaluated by the density functional tight binding theory and the non-equilibrium Green`s function approach. We study the channel density of states, transmission spectra and the ID VD characteristics of such devices under the varying conditions, with focus on the negative differential resistance behavior. Our results show significant change in the NDR peak to valley ratio and the NDR window with such minor intrinsic deformations, especially with the rippling.

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preprint2013arXiv

Performance Analysis of Boron Nitride Embedded Armchair Graphene Nanoribbon MOSFET with Stone Wales Defects

We study the performance of a hybrid Graphene-Boron Nitride {GNR-BN} armchair nanoribbon {a-GNR-BN} MOSFET at its ballistic transport limit. We consider three geometric configurations 3p, 3p+1 and 3p+2 of a-GNR-BN with BN atoms embedded on both sides {2, 4 and 6 BN on each side} on the GNR. The material properties like band gap, effective mass and density of states of these H-passivated structures have been evaluated using the Density Functional Theory {DFT}. Using these material parameters, self-consistent Poisson-Schrodinger simulations are carried out under the Non Equilibrium Greens Function {NEGF} formalism to calculate the ballistic MOSFET device characteristics. For a hybrid nanoribbon of width ~ 5 nm, the simulated ON current is found to be in the range 276 uA - 291 uA with an ON/OFF ratio 7.1 x 10^6 - 7.4 x 10^6 for a VDD = 0.68 V corresponds to 10 nm technology node. We further study the impact of randomly distributed Stone Wales {SW} defects in these hybrid structures and only 2.52% degradation of ON current is observed for SW defect density of 6.35%.

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preprint2013arXiv

Performance Analysis of Strained Monolayer MoS$_{2}$ MOSFET

We present a computational study on the impact of tensile/compressive uniaxial ($\varepsilon_{xx}$) and biaxial ($\varepsilon_{xx}=\varepsilon_{yy}$) strain on monolayer MoS$_{2}$ NMOS and PMOS FETs. The material properties like band structure, carrier effective mass and the multi-band Hamiltonian of the channel, are evaluated using the Density Functional Theory (DFT). Using these parameters, self-consistent Poisson-Schrödinger solution under the Non-Equilibrium Green's Function (NEGF) formalism is carried out to simulate the MOS device characteristics. 1.75$%$ uniaxial tensile strain is found to provide a minor (6$%$) ON current improvement for the NMOSFET, whereas same amount of biaxial tensile strain is found to considerably improve the PMOSFET ON currents by 2-3 times. Compressive strain however degrades both NMOS and PMOS device performance. It is also observed that the improvement in PMOSFET can be attained only when the channel material becomes indirect-gap in nature. We further study the performance degradation in the quasi-ballistic long channel regime using a projected current method.

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