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Paper detail

Sputtering based epitaxial growth and modeling of Cu/Si thin films

Epitaxial copper thin films were deposited by magnetron sputtering. The adatoms during deposition are influenced by deposition parameters which cause variations in thin film properties. XRD and FESEM studies were done to get an insight into the growth mechanisms of the films. A modeling has been done on the epitaxial thin film growth with sputtering process. The parameters during sputtering like, sputtering yield, pressure, temperature, current density, deposition time were related and an attempt has been made to analyze the sputtering process.

preprint2015arXivOpen access
A. S. BhattacharyyaS. KumarS. JanaP. Y. KommuK. GauravS. PrabhaV. S. KujurP. Bharadwaj
cond-mat.mtrl-sci
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Open access8 authors1 topic
Imported metadata coverageMissing code, dataset, citation and institution fields are tracked without dominating the paper.Details
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A. S. BhattacharyyaS. KumarS. JanaP. Y. KommuK. GauravS. PrabhaV. S. KujurP. Bharadwaj

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