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Photoluminescence from Silicon nanoparticles embedded in ammonium silicon hexafluoride

Silicon (Si) nanoparticles (NPs) were synthesized by transforming Si wafer surface to ammonium silicon hexafluoride (ASH) or (NH4)2SiF6 under acid vapor treatment. Si-NPs are embedded within the polycrystalline (ASH) layer formed on the Si surface exhibit a strong green-orange photoluminescence (PL). Difference measurements revealed a major double component spectra consisting of a broad band associated with the ASH-Si wafer interfacial porous oxide layer and a high energy band attributable to Si-NPs embedded in the ASH. The origin of the latter emission can be explained in terms of quantum/spatial confinement effects probably mediated by oxygen related defects in or around Si-NPs. Although Si-NPs are derived from the interface they are much smaller in size than those embedded within the interfacial porous oxide layer (SiOx, 1 < x < 2). Transmission electron microscopy (TEM) combined with Raman scattering and Fourier transformed infrared (FTIR) analysis confirmed the presence of Si-NPs and Si-O bondings pointing to the role of oxygen related defects. The presence of oxygen of up to 4.5 at.% in the (NH4)2SiF6 layer was confirmed by energy dispersive spectroscopy (EDS) analysis.