Abstract

The optical properties of thin films of intermetallic Au3_{3}Hf were experimentally investigated for the first time, which display clear plasmonic properties in the optical and near infrared region with negative permittivity. In contrast to similar alloys, such as films of Au3_{3}Zr, the films express more negative ε′ε' values and lower ε′′ε'' values across most of the wavelengths (370-1570 nm) investigated. The Au3_{3}Hf films were fabricated by DC magnetron sputtering at a range of deposition temperatures, from room temperature to 415o^{o}C, and annealed at different vacuum levels. The films mostly formed as a combination of Au3_{3}Hf, Au2_{2}Hf and Au4_{4}Hf phases when deposited below 400o^{o}C, and exclusively Au3_{3}Hf phase at above 400o^{o}C, indicating key conditions for isolating this phase. The films were stable when annealed at 10−8^{-8} Torr, but when annealed again at 10−6^{-6} Torr the films oxidised and changed into a mix of Au- Hf phases, suggesting resistance to oxidization may be an issue for un-encapsulated applications at elevated temperatures.

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