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Effect of annealing on the superconducting properties of a-Nb(x)Si(1-x) thin films

a-Nb(x)Si(1-x) thin films with thicknesses down to 25 Å have been structurally characterized by TEM (Transmission Electron Microscopy) measurements. As-deposited or annealed films are shown to be continuous and homogeneous in composition and thickness, up to an annealing temperature of 500°C. We have carried out low temperature transport measurements on these films close to the superconductor-to-insulator transition (SIT), and shown a qualitative difference between the effect of annealing or composition, and a reduction of the film thickness on the superconducting properties of a-NbSi. These results question the pertinence of the sheet resistance R_square as the relevant parameter to describe the SIT.

preprint2013arXivOpen access
O. CrausteA. GentilsF. CouëdoY. DolgoroukyL. BergéS. CollinC. A. Marrache-KikuchiL. Dumoulin
cond-mat.supr-con
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O. CrausteA. GentilsF. CouëdoY. DolgoroukyL. BergéS. CollinC. A. Marrache-KikuchiL. Dumoulin

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