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Discharge-produced plasma extreme ultraviolet (EUV) source and ultra high vacuum chamber for studying EUV-induced processes

An experimental setup that directly reproduces Extreme UV-lithography relevant conditions for detailed component exposure tests is described. The EUV setup includes a pulsed plasma radiation source, operating at 13.5 nm; a debris mitigation system; collection and filtering optics; and an UHV experimental chamber, equipped with optical and plasma diagnostics. The first results, identifying the physical parameters and evolution of EUV-induced plasmas are presented. Finally, the applicability and accuracy of the in situ diagnostics is briefly discussed.

preprint2014arXivOpen access
A DolgovO YakushevA AbrikosovE SnegirevV M KrivtsunC J LeeF Bijkerk
physics.plasm-phphysics.ins-det
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Open access7 authors2 topics
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A DolgovO YakushevA AbrikosovE SnegirevV M KrivtsunC J LeeF Bijkerk

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