Atomic Distributions in Topological Insulator Bi2_2Se3−x_{3-x}Tex_x

preprint2016arXivOpen access

Abstract

Bi2_2Se3_3 is a topological insulator and it is often doped with Te to compensate the nn-type carriers due to Se vacancies. Different doping patterns of Te would influence the transport characteristics of the surface states. We study the Te atom distribution in Bi2_2Se3_3 with different Te concentrations, using first-principles density-functional-theory calculations. We show that Te prefer the outer layer, until the composition becomes Bi2_2SeTe2_2 and the outer layer is full of Te. And for a fixed ratio of Se and Te atoms within a single layer, we find that the structures with less number of adjacent Te-Se pairs tend to have lower energies. This might result in the formation of local Te clusters under low annealing temperatures.

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