Ab initio study of carrier mobility in BiOSe
BiOSe is an emerging high-performance layered semiconductor with excellent stability. While experimental studies have explored carrier transport across various doping levels for both -type and -type conduction, a comprehensive theoretical understanding remains incomplete. In this work, we present parameter-free first-principles calculations of the electron and hole mobilities in BiOSe, based on iterative solution of the Boltzmann transport equation that includes electron-phonon scattering and ionized impurity scattering on an equal footing. Intriguingly, we find that BiOSe exhibits high electron mobilities in both the in-plane and out-of-plane directions, whereas the hole mobilities are only significant in the in-plane direction, displaying a unique three-dimensional (3D) electron transport and two-dimensional (2D) hole transport behavior. At 300~K, the calculated intrinsic electron and hole mobilities along the in-plane direction are 447~ and 29~, respectively, which are primarily affected by Fröhlich electron-phonon interactions. Due to its large static dielectric permittivity, BiOSe exhibits an exceptionally high low-temperature electron mobilities above , and its electron mobilities above 50~K is robust against ionized impurity scattering over a wide range of impurity concentrations. By incorporating the Hall effect into our analysis, we predict an in-plane electron Hall mobility of 517~ at 300~K, in excellent agreement with experimental data. These results provide valuable insights into the carrier transport mechanisms in BiOSe, and offer predictive benchmarks for future theoretical and experimental investigations.