Researcher profile

V. E. Calado

V. E. Calado contributes to research discovery and scholarly infrastructure.

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Published work

4 published item(s)

preprint2014arXiv

Ballistic transport in graphene grown by chemical vapor deposition

In this letter we report the observation of ballistic transport on micron length scales in graphene synthesised by chemical vapour deposition (CVD). Transport measurements were done on Hall bar geometries in a liquid He cryostat. Using non-local measurements we show that electrons can be ballistically directed by a magnetic field (transverse magnetic focussing) over length scales of ~μm. Comparison with atomic force microscope measurements suggests a correlation between the absence of wrinkles and the presence of ballistic transport in CVD graphene.

preprint2012arXiv

Formation and control of wrinkles in graphene by the wedging transfer method

We study the formation of wrinkles in graphene upon wet transfer onto a target substrate, whereby draining of water appears to play an important role. We are able to control the orientation of the wrinkles by tuning the surface morphology. Wrinkles are absent in flakes transferred to strongly hydrophobic substrates, a further indication of the role of the interaction of water with the substrate in wrinkle formation. The electrical and structural integrity of the graphene is not affected by the wrinkles, as inferred from Raman measurements and electrical conductivity measurements.

preprint2011arXiv

Efficient C-Phase gate for single-spin qubits in quantum dots

Two-qubit interactions are at the heart of quantum information processing. For single-spin qubits in semiconductor quantum dots, the exchange gate has always been considered the natural two-qubit gate. The recent integration of magnetic field or g-factor gradients in coupled quantum dot systems allows for a one-step, robust realization of the controlled phase (C-Phase) gate instead. We analyze the C-Phase gate durations and fidelities that can be obtained under realistic conditions, including the effects of charge and nuclear field fluctuations, and find gate error probabilities of below 10-4, possibly allowing fault-tolerant quantum computation.

preprint2011arXiv

Mechanical cleaning of graphene

Contamination of graphene due to residues from nanofabrication often introduces background doping and reduces charge carrier mobility. For samples of high electronic quality, post-lithography cleaning treatments are therefore needed. We report that mechanical cleaning based on contact mode AFM removes residues and significantly improves the electronic properties. A mechanically cleaned dual-gated bilayer graphene transistor with hBN dielectrics exhibited a mobility of ~36,000 cm2/Vs at low temperature.