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V. A. Dolgashev

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Published work

2 published item(s)

preprint2022arXiv

Investigations on the multi-sector hard X-Band Structures

The development of high gradient accelerating structures is one of the leading activities of the accelerator community. In the technological research of new construction methods for these devices, high-power testing is a critical step for the verification of their viability. Recent experiments showed that accelerating cavities made from hard copper alloys, can achieve better performance as compared with soft copper ones. The results of experiments showed that welded, hard copper cavities have shown breakdown rate of $10^{-3}$/pulse/meter at a gradient of about 150 MV/m, in the X-band, a using a shaped pulse with a 150 ns flat part. We continue the design, construction, and higher power experimental tests of three cells standing wave (SW) 11.424 GHz accelerating cavities fabricated with hard CuAg alloy to study the RF breakdown physics. Our aim is to fabricate the accelerating structures with innovative technologies easier to handle and cheaper; easier for surfaces inspection; easier for data elaboration and validation of joining techniques. The choice of these new technological approaches and design methods provides also the possibility of allocating the parasitic Higher Order Mode dampers. This paper describes the design of an optimized cavity made with sectors which provides a high longitudinal shunt impedance $R_{sh}$ of the operating mode. The cavity will be fabricated by using the Tungsten Inert Gas process to realize a hard CuAg structure. Two three-cells SW X-band accelerating cavities, to be operated in the $π$-mode and made out of hard CuAg alloy, were already fabricated at INFN-LNF by means of clamping and welding by using the TIG approach. Finally, we also report the RF characterization and low-power RF tests of a two-halves split hard CuAg structure that will be consequently TIG welded and employed for high-gradient tests and for the study of the RF breakdown physics.

preprint2012arXiv

Molybdenum sputtering film characterization for high gradient accelerating structures

Technological advancements are strongly required to fulfill the demands of new accelerator devices with the highest accelerating gradients and operation reliability for the future colliders. To this purpose an extensive R&D regarding molybdenum coatings on copper is in progress. In this contribution we describe chemical composition, deposition quality and resistivity properties of different molybdenum coatings obtained via sputtering. The deposited films are thick metallic disorder layers with different resistivity values above and below the molibdenum dioxide reference value. Chemical and electrical properties of these sputtered coatings have been characterized by Rutherford backscattering, XANES and photoemission spectroscopy. We will also present a three cells standing wave section coated by a molybdenum layer $\sim$ 500 nm thick designed to improve the performance of X-Band accelerating systems.