Source author record

U. Scheithauer

U. Scheithauer appears in the imported research catalog. Authorship, coauthor and topic links are available while profile ownership is still unclaimed.

ResearcherUnclaimed source record

cond-mat.mtrl-sci physics.ins-det

Catalog footprint

What is connected

4works

2topics

4close collaborators

Actions

Connect this record

Open graph Browse works

Inspect adjacent papers, topics, institutions and collaborators without losing the researcher page.

Building this map preview

BZPEER is loading the nearby papers, people, topics and institutions for this page.

preprint2016arXiv

Round Robin: Quantitative Lateral Resolution of PHI XPS microprobes Quantum 2000 / Quantera SXM

The quantitative lateral resolution is a reliable measure for the quality of an XPS microprobe equipped with a focused X-ray beam. It describes the long tail contributions of the X-ray beam intensity distribution. The knowledge of these long tail contributions is essential when judging on the origin of signals of XPS spectra recorded on small-sized features. In this round robin test the quantitative lateral resolution of 7 PHI XPS microprobes has been estimated. As expected, the quantitative lateral resolution has significantly larger values than the nominal X-ray beam diameter. The estimated values of the quantitative lateral resolution follow a trend in time: The newer the monochromator of an XPS microprobe so much the better the quantitative lateral resolution.

preprint2015arXiv

A new LEED Instrument for Quantitative Spot Profile Analysis

A new instrument for spot profile analysis of electron diffraction - SPA-LEED - has been set up. The instrument works either with a transparent phosphor screen for visual inspection of the pattern or in its main mode with a channeltron for the measurement of the intensity. The diffraction pattern is recorded with a fixed channeltron position by scanning the beam over the channeltron aperture using two sets of electrostatic deflection plates. The scanning range covers about 30°. The intensity may vary over five orders of magnitude. The SPA-LEED system was checked with the Si 111 7 x 7 surface. A full width at half maximum of 0.3% of the normal reflex distance corresponding to a transfer width of 110 nm is reproducibly obtained. Under optimum conditions the transfer width rose up to about 200 nm. Initial high resolution measurements have been performed on the system Pb on Cu 111. The results demonstrate the possibilities of the new instrument for qualitative and quantitative analysis.

preprint2015arXiv

Combined AES/Factor Analysis and RBS Investigation of a Thermally Treated Pt/Ti Metallisation on SiO2

Pt/Ti metallisation bilayers are used as bottom electrodes for ferroelectric thin films. During deposition of the ferroelectric films, these electrodes are exposed to elevated temperatures causing modifications of the Pt/Ti bottom electrode. Diffusion and oxidation of the Ti adhesion layer have been studied by the application of factor analysis to AES depth profile data and by RBS. Factor analysis was employed to extract the chemical information from the measured AES spectra and to derive semiquantitative depth profiles of the identified material compounds. RBS was used to obtain the quantitative depth distribution of the elements. By the combination of both methods, diffusion and oxidation processes were observed and could be precisely describe.

preprint2014arXiv

Characterisation of the primary X-ray source of an XPS microprobe Quantum 2000

The outstanding design feature of an XPS microprobe Quantum 2000 is the double focussing ellipsoidally shaped quartz monochromator of the X-ray source. This device monochromatizes the Alkα radiation and refocuses the X-rays from the Al anode to the sample surface. This way, on one hand a variation of the diameter of the X-ray generating electron beam allows to vary the X-ray beam diameter on the sample surface. On the other hand a scanning of the electron beam across the Al anode scans the X-ray beam across the sample surface. The X-ray source was characterized in detail. The lateral dependency of the primary X-ray intensity and the peaks FWHM were measured as function of the position within the electrostatically rasterable scan area. Additionally, the focussing quality of the monochromator was determined. Therefore the lateral intensity distribution within the primary X-ray beam was estimated far below the 1% intensity level.