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U. Pietsch

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cond-mat.mtrl-sci Information Theory math.IT physics.atom-ph

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preprint2016arXiv

Artificial piezoelectricity in centrosymmetric SrTiO3

Defect engineering is an effective and powerful tool to control existing material properties and create completely new ones, which are symmetry-forbidden in a defect-free crystal. This letter reports on the creation of piezoelectrically active near-surface layer of centrosymmetric SrTiO3, modified by the electric field-induced migration of oxygen vacancies. We provide the unequivocal proof of piezoelectricity through the stroboscopic time-resolved X-ray diffraction under alternating electric field. The magnitude of the discovered piezoelectric effect is comparable with the bulk piezoelectric effect in commercial ferroelectric materials. Such artificially formed defect-mediated piezoelectricity can be important as an alternative road for smart materials design.

preprint2016arXiv

Norm minimized Scattering Data from Intensity Spectra

We apply the $l_1$ minimizing technique of compressive sensing (CS) to non-linear quadratic observations. For the example of coherent X-ray scattering we provide the formulae for a Kalman filter approach to quadratic CS and show how to reconstruct the scattering data from their spatial intensity distribution.

preprint2013arXiv

Time dependence of X-ray diffraction intensity of a crystal induced by an intense femtosecond X-ray pulse

The time evolution of the electron density and the resulting time dependence of X-ray diffraction peak intensity in a crystal irradiated by highly intense femtosecond pulses of an XFEL is investigated theoretically on the basis of rate equations for bound electrons and the Boltzmann equation for the kinetics of the unbound electron gas that plays an essential role in the time evolution of the electron density of a crystal. The photoionization, Auger process, electron-impact ionization, electron--electron scattering, and three-body recombination have been implemented in the system of rate equations. An algorithm for the numerical solution of the rate equations was simplified by incorporating analytical expressions for the cross sections of all the electron configurations in ions within the framework of the effective charge model. Using this approach we evaluate the time dependence of the inner shell population and electronic kinetic energy during the time of XFEL pulse propagation through the crystal for photon energies between 3 and 12 keV and a pulse width of 40 fs considering a flux of 10^12 ph/pulse (focusing on a spot size of ~ 1 mum^2, this flux corresponds to a fluence ranging between 0.6 and 1.6 mJ/mum^2). The time evolution of the atomic scattering factor and its fluctuation is numerically analyzed for the case of a Silicon crystal taking into account the decrease of the bound electron density during the pulse propagation. The time integrated intensity drops dramatically if the fluence of the XFEL pulse exceeds 1.6 mJ/mum^2.