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Researcher profile

Thierry Fournier

Thierry Fournier contributes to research discovery and scholarly infrastructure.

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cond-mat.mes-hallcond-mat.supr-con

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Published work

3 published item(s)

preprint2013arXiv

Phonon Heat Conduction in Corrugated Silicon Nanowires Below the Casimir Limit

The thermal conductance of straight and corrugated monocrystalline silicon nanowires has been measured between 0.3 K and 5 K. The difference in the thermal transport between corrugated nanowires and straight ones demonstrates a strong reduction in the mean free path of the phonons. This averaged mean free path is remarkably smaller than the smaller diameter of the nanowire, evidencing a phonon thermal transport reduced below the Casimir limit. Monte Carlo simulations highlight that this effect can be attributed to significant multiple scattering of ballistic phonons occuring on the corrugated surfaces. This result suggests an original approach to transforming a monocrystalline material into a phonon glass.

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preprint2011arXiv

Novel E-beam lithography technique for in-situ junction fabrication: the controlled undercut

We present a novel shadow evaporation technique for the realization of junctions and capacitors. The design by E-beam lithography of strongly asymmetric undercuts on a bilayer resist enables in-situ fabrication of junctions and capacitors without the use of the well-known suspended bridge[1]. The absence of bridges increases the mechanical robustness of the resist mask as well as the accessible range of the junction size, from 0.01 to more than 10000 micron square. We have fabricated Al/AlOx/Al Josephson junctions, phase qubit and capacitors using a 100kV E- beam writer. Although this high voltage enables a precise control of the undercut, implementation using a conventional 20kV E-beam is also discussed. The phase qubit coherence times, extracted from spectroscopy resonance width, Rabi and Ramsey oscillations decay and energy relaxation measurements, are longer than the ones obtained in our previous samples realized by standard techniques. These results demonstrate the high quality of the junction obtained by this controlled undercut technique.

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preprint2011arXiv

Persistence of superconductivity in niobium ultrathin films grown on R-Plane Sapphire

We report on a combined structural and electronic analysis of niobium ultrathin films (from 2 to 10 nm) deposited in ultra-high vacuum on atomically flat R-plane sapphire wafers. A textured polycrystalline morphology is observed for the thinnest films showing that hetero-epitaxy is not achieved under a thickness of 3.3nm, which almost coincides with the first measurement of a superconducting state. The superconducting critical temperature rise takes place on a very narrow thickness range, of the order of a single monolayer (ML). The thinnest superconducting sample (3 nm/9ML) has an offset critical temperature above 4.2K and can be processed by standard nanofabrication techniques to generate air- and time-stable superconducting nanostructures, useful for quantum devices.

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