Source author record

Tanchao Pu

Tanchao Pu appears in the imported research catalog. Authorship, coauthor and topic links are available while profile ownership is still unclaimed.

ResearcherUnclaimed source record

Catalog footprint

What is connected

2works
1topics
4close collaborators

Actions

Connect this record

Log in to claim

Research graph

See the researcher in context

Open full explorer

Inspect adjacent papers, topics, institutions and collaborators without losing the researcher page.

Building this map preview

BZPEER is loading the nearby papers, people, topics and institutions for this page.

Published work

2 published item(s)

preprint2020arXiv

Deeply Subwavelength Optical Imaging

We report the experimental demonstration of deeply subwavelength far-field optical imaging of unlabelled samples with resolution better than $λ/20$. We beat the ~$λ$/2 diffraction limit of conventional optical microscopy several times over by recording the intensity pattern of coherent light scattered from the object into the far-field. We retrieve information about the object with a deep learning neural network trained on scattering events from a large set of known objects.

preprint2020arXiv

Optical Metrology of Sub-Wavelength Objects Enabled by Artificial Intelligence

Microscopes and various forms of interferometers have been used for decades in optical metrology of objects that are typically larger than the wavelength of light λ. However, metrology of subwavelength objects was deemed impossible due to the diffraction limit. We report that measurement of the physical size of sub-wavelength objects with accuracy exceeding λ/800 by analyzing the diffraction pattern of coherent light scattered by the objects with deep learning enabled analysis. With a 633nm laser, we show that the width of sub-wavelength slits in opaque screen can be measured with accuracy of 0.77nm, challenging the accuracy of electron beam and ion beam lithographies. The technique is suitable for high-rate non-contact measurements of nanometric sizes in smart manufacturing applications with integrated metrology and processing tools.